HTELabs THIN FILM DEPOSITIONS

HTE LABS THIN FILMS CAPABILITIES
RESISTIVE FILMS High stability, Laser trim able, Low TCR
NiCr 5, 10, 25,...200, 300, 400 ohms/sq, +/-10 to +/-100ppm/degC
TaN2 25,50,500,1000, to 2500 ohms/sq, +/-5 to +/-150ppm/degC
SiCr 0.5K, 1K, 2.5K, 5K, 10k, 20K ohms/sq, +/-10 to +/-200ppm/degC
DIFFUSION BARRIER METALS Ni, Mo, Pt, Pd, Ta, Ti, TiW, TiNx, TiW:Nx.....
ADHESION LAYERS Cr, Mo, Ni, NiCr, Si, Ti, TiW, TiNx....
CONDUCTIVE LAYERS Al, Au, beta-Ta, Cu, Ni, Sn, SnPb, Zr...
NITRIDE AND OXIDE FILMS AlN, Fe2O3, Si3N4

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