PVD - SPUTTERING DEPOSITION - PHYSICAL VAPOR DEPOSITION - SPUTTERING THIN FILMS METALS ALLOYS DIELECTRICS DC RF MAGNETRON SPUTTER DEPOSITION AND REACTIVE SPUTTERING, (Cr)60(SiO)40 Chromium 60% - silicon monoxide 40%, (In2O3)80(SnO2)20 Indium oxide 80% - tin oxide 20%, (In2O3)85-(SnO2)15 Indium oxide 85% - tin oxide 15%, (In2O3)90-(SnO2)10 Indium oxide 90% - tin oxide 10%, (In2O3)91-(SnO2)9 Indium oxide 91 mol% - tin oxide 9 mol%, Ag Silver, Al Aluminum, Al2O3 Aluminum Oxide, Al98Cu2 Aluminum Copper 2%, Al96Cu4 Aluminum Copper 4%, Al99Si1 Aluminum Silicon 1%, AlF3 Aluminum Fluoride, AlN Aluminum Nitride, Al-Pr-Oxide Aluminum Praseodymium Oxide, As2S3 Arsen sulphur, Au Gold, B Boron, B4C Boron Carbide, B2O3 Boron Oxide, BaF2 Barium Fluoride, BaTiO3 Barium Titanate, Be Beryllium, BeO Beryllium Oxide, Bi Bismuth, Bi2O3 Bismuth Oxide, Bi4Ti3O12 Bismuth Titanate, BN Boron Nitride, C Carbon, CaF2 Calcium Fluoride, CaO Calcium Oxide, Cd Cadmium, CdS Cadmium Sulfide, CdSe Cadmium Selenide, CdTe Cadmium Telluride, Ce Cerium, CeF3 Cerium fluoride, CeO2 Cerium Oxide, Co Cobalt, Cr Chromium, Cr2C3 Chromium carbide, Cr3C2 Chromium carbide, Cr2O3 Chromium Oxide, CrB2 Chromium Boride, CrSi2 Chromium Silicide, Cr3Si Chromium Silicide, Cr2Si2 Chromium Silicide, Cr–SiO Chromium Silicon oxide, CsF Cesium Fluoride, CsI Cesium iodide, Cu Copper, Cu2O Copper dioxide, CuO Copper Oxide, Cu2Se Copper selenide, DyF3 Dysprosium fluoride, Dy2O3 Dysprosium oxide, ErF3 Erbium fluoride, Er2O3 Erbium Oxide, Eu2O3 Europium oxide, EuF3 Europium fluoride, Fe Iron, Fe2O3 Iron Oxide, Fe3O4 Iron oxide, Ga Gallium, GaP Gallium Phosoforide, Ga2O3 Gallium Oxide, GaAs Gallium Arsenide, Gd2O3 Gadolinium oxide, GdF3 Gadolinium fluoride, Ge Germanium, GeO2 Germanium Oxide, Ge2Sb2Te5 GST Germanium Antimony Tellurium, Hf Hafnium, HfB2 Hafnium boride, HfC Hafnium Carbide, HfF4 Hafnium fluoride, HfN Hafnium Nitride, HfO2 Hafnium Oxide, HfO2-Y2O3 Hafnium oxide 10-15t%, yttria stab., HfSi2 Hafnium silicide, Ho2O3 Holmium oxide, HoF3 Holmium fluoride, In Indium, In2O3 Indium Oxide, In2Se3 Indium selenide, In90Sn10 Indium - Tin, Ir Iridium, ITO Indium Tin Oxide, ITO-In2O3-SnO2 Indium Tin Oxide In2O3-SnO2, La-Nb-Oxide Lanthanum niobium oxide, La-Ti-Oxide Lanthanum titanium oxide, La2O3 Lanthanum Oxide, LaAlO3 Lanthanum Aluminate, LaB6 Lanthanum Boride, LaF3 Lanthanum fluoride, LiF Lithium fluoride, LiNbO3 Lithium Niobate, Lu2O3 Lutetium oxide, LuF3 Lutetium fluoride, Mg Magnesium, MgF2 Magnesium Fluoride, MgO Magnesium Oxide, Mn Manganese, MnS Manganese sulfide, Mo Molybdenum, Mo2C Molybdenum carbide, MoO3 Molybdenum Oxide, MoS2 Molybdenum Sulfide, MoSi2 Molybdenum Silicide, NaF Sodium fluoride, Na3AlF6 Sodium hexafluoroaluminate - Cryolite, Na5Al3F14 Sodium fluoroaluminate, Nb Niobium, NbC Niobium carbide, NbN Niobium nitride, Nb2O5 Niobium Oxide, NbSi2 Niobium silicide, NdF3 Neodymium fluoride, Nd2O3 Neodymium oxide, Ni Nickel, Ni80Cr20 Nickel 80 Chromium 20, Ni81Fe19 Nickel 81 Iron 19, Ni93V7 Nickel 93 Vanadium 7, NiCr Nickel Chromium, NiO Nickel Oxide, Os Osmium, Pb Lead, PbF2 Lead fluoride, PbO Lead Oxide, PbS Lead sulfide, PbSe Lead selenide, PbTe Lead telluride, Pd Palladium, Pr2O3 Praseodymium oxide, PrF3 Praseodymium fluoride, Pt Platinum, Rb Rubidium, Re Rhenium, Rh Rhodium, Ru Ruthenium, Sb Antimony, Sb2O3 Antimony Oxide, Sb2S3 Antimony sulfide, Sc2O3 Scandium Oxide, ScF3 Scandium fluoride, Se Selenium, Si Silicon, Si-Al-Oxide Silicon aluminate, Si3N4 Silicon Nitride, SiC Silicon Carbide, SiO Silicon Monoxide, SiO2 Silicon Dioxide, Sm2O3 Samarium oxide, SmF2 Samarium fluoride, Sn Tin, SnO Tin Oxide, SnO2 Tin dioxide, SrF2 Strontium fluoride, SrTiO3 Strontium Titanate, SrZrO3 Strontium zirconate, Ta Tantalum, Ta2O5 Tantalum Oxide, Ta2O5-X 0, TaC Tantalum Carbide, TaN Tantalum Nitride, TaSe2 Tantalum selenide, TaSi2 Tantalum Silicide, Ta5Si3 Tantalum silicide, Tb2O3 Terbium oxide, TbF3 Terbium fluoride, Te Tellurium, Th Thorium, ThF4 Thorium fluoride, ThO2 Thorium oxide, Ti Titanium, TiB2 Titanium Boride, TiC Titanium Carbide, TiN Titanium Nitride, TiO Titanium oxide, TiO2 Titanium dioxide, Ti2O3 Titanium trioxide, Ti3O5 Titanium pentoxide, TiSi2 Titanium Silicide, Ti-Al-Oxide Titanium aluminate, Ti5Si3 Titanium silicide, Ti-Pr-Oxide Titanium praseodymium oxide, U Uranium, UO2 Uranium oxide, V Vanadium, VC Vanadium carbide, V2O5 Vanadium Oxide, VSi2 Vanadium silicide, W Tungsten, W90Ti10 Tungsten 90 Titanium 10, WC Tungsten Carbide, W2C Tungsten IV Carbide, WO3 Tungsten oxide, WS2 Tungsten Sulfide, WSe2 Tungsten selenide, WSi2 Tungsten Silicide, WTi Tungsten Titanium, Y Yttrium, YF3 Yttrium fluoride, Y2O3 Yttrium Oxide, Yb2O3 Ytterbium oxide, YbF3 Ytterbium fluoride, Y-Ba-Fluoride Ytterbium barium fluoride, Yb-Ca-Fluoride Ytterbium calcium fluoride, YBCO Yttrium Barium Copper Oxide, Zn Zinc, ZnO Zinc Oxide, ZnO/Al2O3 Zinc Oxide / Aluminum Oxide, ZnS Zinc Sulfide, ZnSe Zinc Selenide, ZnTe Zinc Teluride, Zr Zirconium, ZrB2 Zirconium boride, ZrC Zirconium carbide, ZrF4 Zirconium fluoride, ZrO Zirconium Oxide, ZrO2 Zirconium dioxide, ZrO2 -5 wt% CaO Zirconium oxide-calcia stab., ZrO2-Y2O3 Zirconium Oxide Yttrium Oxide, ZrSi2 Zirconium silicide, PHYSICAL VAPOR DEPOSITION - METALS, ALLOYS, DIELECTRICS MAGNETRON SPUTTER DEPOSITION, DC , RF PVD REACTIVE SPUTTERING (Cr)60(SiO)40 CHROMIUM 60% - SILICON MONOXIDE 40% PHYSICAL VAPOR DEPOSITION - PVD - (CR)60(SIO)40 - SPUTTER DEPOSITION (In2O3)80(SnO2)20 INDIUM OXIDE 80% - TIN OXIDE 20% PHYSICAL VAPOR DEPOSITION - PVD - (IN2O3)80(SNO2)20 - SPUTTER DEPOSITION (In2O3)85-(SnO2)15 INDIUM OXIDE 85% - TIN OXIDE 15% PHYSICAL VAPOR DEPOSITION - PVD - (IN2O3)85-(SNO2)15 - SPUTTER DEPOSITION (In2O3)90-(SnO2)10 INDIUM OXIDE 90% - TIN OXIDE 10% PHYSICAL VAPOR DEPOSITION - PVD - (IN2O3)90-(SNO2)10 - SPUTTER DEPOSITION (In2O3)91-(SnO2)9 INDIUM OXIDE 91 MOL% - TIN OXIDE 9 MOL% PHYSICAL VAPOR DEPOSITION - PVD - (IN2O3)91-(SNO2)9 - SPUTTER DEPOSITION Ag SILVER PHYSICAL VAPOR DEPOSITION - PVD - AG - SPUTTER DEPOSITION Al ALUMINUM PHYSICAL VAPOR DEPOSITION - PVD - AL - SPUTTER DEPOSITION Al2O3 ALUMINUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - AL2O3 - SPUTTER DEPOSITION Al98Cu2 ALUMINUM COPPER 2% PHYSICAL VAPOR DEPOSITION - PVD - AL98CU2 - SPUTTER DEPOSITION Al96Cu4 ALUMINUM COPPER 4% PHYSICAL VAPOR DEPOSITION - PVD - AL96CU4 - SPUTTER DEPOSITION Al99Si1 ALUMINUM SILICON 1% PHYSICAL VAPOR DEPOSITION - PVD - AL99SI1 - SPUTTER DEPOSITION AlF3 ALUMINUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - ALF3 - SPUTTER DEPOSITION AlN ALUMINUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - ALN - SPUTTER DEPOSITION Al-Pr-Oxide ALUMINUM PRASEODYMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - AL-PR-OXIDE - SPUTTER DEPOSITION As2S3 ARSEN SULPHUR PHYSICAL VAPOR DEPOSITION - PVD - AS2S3 - SPUTTER DEPOSITION Au GOLD PHYSICAL VAPOR DEPOSITION - PVD - AU - SPUTTER DEPOSITION B BORON PHYSICAL VAPOR DEPOSITION - PVD - B - SPUTTER DEPOSITION B4C BORON CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - B4C - SPUTTER DEPOSITION B2O3 BORON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - B2O3 - SPUTTER DEPOSITION BaF2 BARIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - BAF2 - SPUTTER DEPOSITION BaTiO3 BARIUM TITANATE PHYSICAL VAPOR DEPOSITION - PVD - BATIO3 - SPUTTER DEPOSITION Be BERYLLIUM PHYSICAL VAPOR DEPOSITION - PVD - BE - SPUTTER DEPOSITION BeO BERYLLIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - BEO - SPUTTER DEPOSITION Bi BISMUTH PHYSICAL VAPOR DEPOSITION - PVD - BI - SPUTTER DEPOSITION Bi2O3 BISMUTH OXIDE PHYSICAL VAPOR DEPOSITION - PVD - BI2O3 - SPUTTER DEPOSITION Bi4Ti3O12 BISMUTH TITANATE PHYSICAL VAPOR DEPOSITION - PVD - BI4TI3O12 - SPUTTER DEPOSITION BN BORON NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - BN - SPUTTER DEPOSITION C CARBON PHYSICAL VAPOR DEPOSITION - PVD - C - SPUTTER DEPOSITION CaF2 CALCIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CAF2 - SPUTTER DEPOSITION CaO CALCIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CAO - SPUTTER DEPOSITION Cd CADMIUM PHYSICAL VAPOR DEPOSITION - PVD - CD - SPUTTER DEPOSITION CdS CADMIUM SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - CDS - SPUTTER DEPOSITION CdSe CADMIUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - CDSE - SPUTTER DEPOSITION CdTe CADMIUM TELLURIDE PHYSICAL VAPOR DEPOSITION - PVD - CDTE - SPUTTER DEPOSITION Ce CERIUM PHYSICAL VAPOR DEPOSITION - PVD - CE - SPUTTER DEPOSITION CeF3 CERIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CEF3 - SPUTTER DEPOSITION CeO2 CERIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CEO2 - SPUTTER DEPOSITION Co COBALT PHYSICAL VAPOR DEPOSITION - PVD - CO - SPUTTER DEPOSITION Cr CHROMIUM PHYSICAL VAPOR DEPOSITION - PVD - CR - SPUTTER DEPOSITION Cr2C3 CHROMIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - CR2C3 - SPUTTER DEPOSITION Cr3C2 CHROMIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - CR3C2 - SPUTTER DEPOSITION Cr2O3 CHROMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CR2O3 - SPUTTER DEPOSITION CrB2 CHROMIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - CRB2 - SPUTTER DEPOSITION CrSi2 CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CRSI2 - SPUTTER DEPOSITION Cr3Si CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CR3SI - SPUTTER DEPOSITION Cr2Si2 CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CR2SI2 - SPUTTER DEPOSITION Cr–SiO CHROMIUM SILICON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CR–SIO - SPUTTER DEPOSITION CsF CESIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CSF - SPUTTER DEPOSITION CsI CESIUM IODIDE PHYSICAL VAPOR DEPOSITION - PVD - CSI - SPUTTER DEPOSITION Cu COPPER PHYSICAL VAPOR DEPOSITION - PVD - CU - SPUTTER DEPOSITION Cu2O COPPER DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - CU2O - SPUTTER DEPOSITION CuO COPPER OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CUO - SPUTTER DEPOSITION Cu2Se COPPER SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - CU2SE - SPUTTER DEPOSITION DyF3 DYSPROSIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - DYF3 - SPUTTER DEPOSITION Dy2O3 DYSPROSIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - DY2O3 - SPUTTER DEPOSITION ErF3 ERBIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - ERF3 - SPUTTER DEPOSITION Er2O3 ERBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ER2O3 - SPUTTER DEPOSITION Eu2O3 EUROPIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - EU2O3 - SPUTTER DEPOSITION EuF3 EUROPIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - EUF3 - SPUTTER DEPOSITION Fe IRON PHYSICAL VAPOR DEPOSITION - PVD - FE - SPUTTER DEPOSITION Fe2O3 IRON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - FE2O3 - SPUTTER DEPOSITION Fe3O4 IRON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - FE3O4 - SPUTTER DEPOSITION Ga GALLIUM PHYSICAL VAPOR DEPOSITION - PVD - GA - SPUTTER DEPOSITION GaP GALLIUM PHOSOFORIDE PHYSICAL VAPOR DEPOSITION - PVD - GAP - SPUTTER DEPOSITION Ga2O3 GALLIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - GA2O3 - SPUTTER DEPOSITION GaAs GALLIUM ARSENIDE PHYSICAL VAPOR DEPOSITION - PVD - GAAS - SPUTTER DEPOSITION Gd2O3 GADOLINIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - GD2O3 - SPUTTER DEPOSITION GdF3 GADOLINIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - GDF3 - SPUTTER DEPOSITION Ge GERMANIUM PHYSICAL VAPOR DEPOSITION - PVD - GE - SPUTTER DEPOSITION GeO2 GERMANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - GEO2 - SPUTTER DEPOSITION Ge2Sb2Te5 GST GERMANIUM ANTIMONY TELLURIUM PHYSICAL VAPOR DEPOSITION - PVD - GE2SB2TE5 - SPUTTER DEPOSITION Hf HAFNIUM PHYSICAL VAPOR DEPOSITION - PVD - HF - SPUTTER DEPOSITION HfB2 HAFNIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - HFB2 - SPUTTER DEPOSITION HfC HAFNIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - HFC - SPUTTER DEPOSITION HfF4 HAFNIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - HFF4 - SPUTTER DEPOSITION HfN HAFNIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - HFN - SPUTTER DEPOSITION HfO2 HAFNIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - HFO2 - SPUTTER DEPOSITION HfO2-Y2O3 HAFNIUM OXIDE 10-15T%, YTTRIA STAB. PHYSICAL VAPOR DEPOSITION - PVD - HFO2-Y2O3 - SPUTTER DEPOSITION HfSi2 HAFNIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - HFSI2 - SPUTTER DEPOSITION Ho2O3 HOLMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - HO2O3 - SPUTTER DEPOSITION HoF3 HOLMIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - HOF3 - SPUTTER DEPOSITION In INDIUM PHYSICAL VAPOR DEPOSITION - PVD - IN - SPUTTER DEPOSITION In2O3 INDIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - IN2O3 - SPUTTER DEPOSITION In2Se3 INDIUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - IN2SE3 - SPUTTER DEPOSITION In90Sn10 INDIUM - TIN PHYSICAL VAPOR DEPOSITION - PVD - IN90SN10 - SPUTTER DEPOSITION Ir IRIDIUM PHYSICAL VAPOR DEPOSITION - PVD - IR - SPUTTER DEPOSITION ITO INDIUM TIN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ITO - SPUTTER DEPOSITION ITO-In2O3-SnO2 INDIUM TIN OXIDE IN2O3-SNO2 PHYSICAL VAPOR DEPOSITION - PVD - ITO-IN2O3-SNO2 - SPUTTER DEPOSITION La-Nb-Oxide LANTHANUM NIOBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LA-NB-OXIDE - SPUTTER DEPOSITION La-Ti-Oxide LANTHANUM TITANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LA-TI-OXIDE - SPUTTER DEPOSITION La2O3 LANTHANUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LA2O3 - SPUTTER DEPOSITION LaAlO3 LANTHANUM ALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - LAALO3 - SPUTTER DEPOSITION LaB6 LANTHANUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - LAB6 - SPUTTER DEPOSITION LaF3 LANTHANUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LAF3 - SPUTTER DEPOSITION LiF LITHIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LIF - SPUTTER DEPOSITION LiNbO3 LITHIUM NIOBATE PHYSICAL VAPOR DEPOSITION - PVD - LINBO3 - SPUTTER DEPOSITION Lu2O3 LUTETIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LU2O3 - SPUTTER DEPOSITION LuF3 LUTETIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LUF3 - SPUTTER DEPOSITION Mg MAGNESIUM PHYSICAL VAPOR DEPOSITION - PVD - MG - SPUTTER DEPOSITION MgF2 MAGNESIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - MGF2 - SPUTTER DEPOSITION MgO MAGNESIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - MGO - SPUTTER DEPOSITION Mn MANGANESE PHYSICAL VAPOR DEPOSITION - PVD - MN - SPUTTER DEPOSITION MnS MANGANESE SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - MNS - SPUTTER DEPOSITION Mo MOLYBDENUM PHYSICAL VAPOR DEPOSITION - PVD - MO - SPUTTER DEPOSITION Mo2C MOLYBDENUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - MO2C - SPUTTER DEPOSITION MoO3 MOLYBDENUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - MOO3 - SPUTTER DEPOSITION MoS2 MOLYBDENUM SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - MOS2 - SPUTTER DEPOSITION MoSi2 MOLYBDENUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - MOSI2 - SPUTTER DEPOSITION NaF SODIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - NAF - SPUTTER DEPOSITION Na3AlF6 SODIUM HEXAFLUOROALUMINATE - CRYOLITE PHYSICAL VAPOR DEPOSITION - PVD - NA3ALF6 - SPUTTER DEPOSITION Na5Al3F14 SODIUM FLUOROALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - NA5AL3F14 - SPUTTER DEPOSITION Nb NIOBIUM PHYSICAL VAPOR DEPOSITION - PVD - NB - SPUTTER DEPOSITION NbC NIOBIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - NBC - SPUTTER DEPOSITION NbN NIOBIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - NBN - SPUTTER DEPOSITION Nb2O5 NIOBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NB2O5 - SPUTTER DEPOSITION NbSi2 NIOBIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - NBSI2 - SPUTTER DEPOSITION NdF3 NEODYMIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - NDF3 - SPUTTER DEPOSITION Nd2O3 NEODYMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ND2O3 - SPUTTER DEPOSITION Ni NICKEL PHYSICAL VAPOR DEPOSITION - PVD - NI - SPUTTER DEPOSITION Ni80Cr20 NICKEL 80 CHROMIUM 20 PHYSICAL VAPOR DEPOSITION - PVD - NI80CR20 - SPUTTER DEPOSITION Ni81Fe19 NICKEL 81 IRON 19 PHYSICAL VAPOR DEPOSITION - PVD - NI81FE19 - SPUTTER DEPOSITION Ni93V7 NICKEL 93 VANADIUM 7 PHYSICAL VAPOR DEPOSITION - PVD - NI93V7 - SPUTTER DEPOSITION NiCr NICKEL CHROMIUM PHYSICAL VAPOR DEPOSITION - PVD - NICR - SPUTTER DEPOSITION NiO NICKEL OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NIO - SPUTTER DEPOSITION Os OSMIUM PHYSICAL VAPOR DEPOSITION - PVD - OS - SPUTTER DEPOSITION Pb LEAD PHYSICAL VAPOR DEPOSITION - PVD - PB - SPUTTER DEPOSITION PbF2 LEAD FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - PBF2 - SPUTTER DEPOSITION PbO LEAD OXIDE PHYSICAL VAPOR DEPOSITION - PVD - PBO - SPUTTER DEPOSITION PbS LEAD SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - PBS - SPUTTER DEPOSITION PbSe LEAD SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - PBSE - SPUTTER DEPOSITION PbTe LEAD TELLURIDE PHYSICAL VAPOR DEPOSITION - PVD - PBTE - SPUTTER DEPOSITION Pd PALLADIUM PHYSICAL VAPOR DEPOSITION - PVD - PD - SPUTTER DEPOSITION Pr2O3 PRASEODYMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - PR2O3 - SPUTTER DEPOSITION PrF3 PRASEODYMIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - PRF3 - SPUTTER DEPOSITION Pt PLATINUM PHYSICAL VAPOR DEPOSITION - PVD - PT - SPUTTER DEPOSITION Rb RUBIDIUM PHYSICAL VAPOR DEPOSITION - PVD - RB - SPUTTER DEPOSITION Re RHENIUM PHYSICAL VAPOR DEPOSITION - PVD - RE - SPUTTER DEPOSITION Rh RHODIUM PHYSICAL VAPOR DEPOSITION - PVD - RH - SPUTTER DEPOSITION Ru RUTHENIUM PHYSICAL VAPOR DEPOSITION - PVD - RU - SPUTTER DEPOSITION Sb ANTIMONY PHYSICAL VAPOR DEPOSITION - PVD - SB - SPUTTER DEPOSITION Sb2O3 ANTIMONY OXIDE PHYSICAL VAPOR DEPOSITION - PVD - SB2O3 - SPUTTER DEPOSITION Sb2S3 ANTIMONY SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - SB2S3 - SPUTTER DEPOSITION Sc2O3 SCANDIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - SC2O3 - SPUTTER DEPOSITION ScF3 SCANDIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - SCF3 - SPUTTER DEPOSITION Se SELENIUM PHYSICAL VAPOR DEPOSITION - PVD - SE - SPUTTER DEPOSITION Si SILICON PHYSICAL VAPOR DEPOSITION - PVD - SI - SPUTTER DEPOSITION Si-Al-Oxide SILICON ALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - SI-AL-OXIDE - SPUTTER DEPOSITION Si3N4 SILICON NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - SI3N4 - SPUTTER DEPOSITION SiC SILICON CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - SIC - SPUTTER DEPOSITION SiO SILICON MONOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SIO - SPUTTER DEPOSITION SiO2 SILICON DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SIO2 - SPUTTER DEPOSITION Sm2O3 SAMARIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - SM2O3 - SPUTTER DEPOSITION SmF2 SAMARIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - SMF2 - SPUTTER DEPOSITION Sn TIN PHYSICAL VAPOR DEPOSITION - PVD - SN - SPUTTER DEPOSITION SnO TIN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - SNO - SPUTTER DEPOSITION SnO2 TIN DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SNO2 - SPUTTER DEPOSITION SrF2 STRONTIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - SRF2 - SPUTTER DEPOSITION SrTiO3 STRONTIUM TITANATE PHYSICAL VAPOR DEPOSITION - PVD - SRTIO3 - SPUTTER DEPOSITION SrZrO3 STRONTIUM ZIRCONATE PHYSICAL VAPOR DEPOSITION - PVD - SRZRO3 - SPUTTER DEPOSITION Ta TANTALUM PHYSICAL VAPOR DEPOSITION - PVD - TA - SPUTTER DEPOSITION Ta2O5 TANTALUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TA2O5 - SPUTTER DEPOSITION Ta2O5-X 0 PHYSICAL VAPOR DEPOSITION - PVD - TA2O5-X - SPUTTER DEPOSITION TaC TANTALUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TAC - SPUTTER DEPOSITION TaN TANTALUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - TAN - SPUTTER DEPOSITION TaSe2 TANTALUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - TASE2 - SPUTTER DEPOSITION TaSi2 TANTALUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TASI2 - SPUTTER DEPOSITION Ta5Si3 TANTALUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TA5SI3 - SPUTTER DEPOSITION Tb2O3 TERBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TB2O3 - SPUTTER DEPOSITION TbF3 TERBIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - TBF3 - SPUTTER DEPOSITION Te TELLURIUM PHYSICAL VAPOR DEPOSITION - PVD - TE - SPUTTER DEPOSITION Th THORIUM PHYSICAL VAPOR DEPOSITION - PVD - TH - SPUTTER DEPOSITION ThF4 THORIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - THF4 - SPUTTER DEPOSITION ThO2 THORIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - THO2 - SPUTTER DEPOSITION Ti TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - TI - SPUTTER DEPOSITION TiB2 TITANIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - TIB2 - SPUTTER DEPOSITION TiC TITANIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TIC - SPUTTER DEPOSITION TiN TITANIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - TIN - SPUTTER DEPOSITION TiO TITANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TIO - SPUTTER DEPOSITION TiO2 TITANIUM DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - TIO2 - SPUTTER DEPOSITION Ti2O3 TITANIUM TRIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - TI2O3 - SPUTTER DEPOSITION Ti3O5 TITANIUM PENTOXIDE PHYSICAL VAPOR DEPOSITION - PVD - TI3O5 - SPUTTER DEPOSITION TiSi2 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TISI2 - SPUTTER DEPOSITION Ti-Al-Oxide TITANIUM ALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - TI-AL-OXIDE - SPUTTER DEPOSITION Ti5Si3 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TI5SI3 - SPUTTER DEPOSITION Ti-Pr-Oxide TITANIUM PRASEODYMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TI-PR-OXIDE - SPUTTER DEPOSITION U URANIUM PHYSICAL VAPOR DEPOSITION - PVD - U - SPUTTER DEPOSITION UO2 URANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - UO2 - SPUTTER DEPOSITION V VANADIUM PHYSICAL VAPOR DEPOSITION - PVD - V - SPUTTER DEPOSITION VC VANADIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - VC - SPUTTER DEPOSITION V2O5 VANADIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - V2O5 - SPUTTER DEPOSITION VSi2 VANADIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - VSI2 - SPUTTER DEPOSITION W TUNGSTEN PHYSICAL VAPOR DEPOSITION - PVD - W - SPUTTER DEPOSITION W90Ti10 TUNGSTEN 90 TITANIUM 10 PHYSICAL VAPOR DEPOSITION - PVD - W90TI10 - SPUTTER DEPOSITION WC TUNGSTEN CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - WC - SPUTTER DEPOSITION W2C TUNGSTEN IV CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - W2C - SPUTTER DEPOSITION WO3 TUNGSTEN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - WO3 - SPUTTER DEPOSITION WS2 TUNGSTEN SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - WS2 - SPUTTER DEPOSITION WSe2 TUNGSTEN SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - WSE2 - SPUTTER DEPOSITION WSi2 TUNGSTEN SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - WSI2 - SPUTTER DEPOSITION WTi TUNGSTEN TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - WTI - SPUTTER DEPOSITION Y YTTRIUM PHYSICAL VAPOR DEPOSITION - PVD - Y - SPUTTER DEPOSITION YF3 YTTRIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - YF3 - SPUTTER DEPOSITION Y2O3 YTTRIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - Y2O3 - SPUTTER DEPOSITION Yb2O3 YTTERBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - YB2O3 - SPUTTER DEPOSITION YbF3 YTTERBIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - YBF3 - SPUTTER DEPOSITION Y-Ba-Fluoride YTTERBIUM BARIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - Y-BA-FLUORIDE - SPUTTER DEPOSITION Yb-Ca-Fluoride YTTERBIUM CALCIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - YB-CA-FLUORIDE - SPUTTER DEPOSITION YBCO YTTRIUM BARIUM COPPER OXIDE PHYSICAL VAPOR DEPOSITION - PVD - YBCO - SPUTTER DEPOSITION Zn ZINC PHYSICAL VAPOR DEPOSITION - PVD - ZN - SPUTTER DEPOSITION ZnO ZINC OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNO - SPUTTER DEPOSITION ZnO/Al2O3 ZINC OXIDE / ALUMINUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNO/AL2O3 - SPUTTER DEPOSITION ZnS ZINC SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNS - SPUTTER DEPOSITION ZnSe ZINC SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNSE - SPUTTER DEPOSITION ZnTe ZINC TELURIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNTE - SPUTTER DEPOSITION Zr ZIRCONIUM PHYSICAL VAPOR DEPOSITION - PVD - ZR - SPUTTER DEPOSITION ZrB2 ZIRCONIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRB2 - SPUTTER DEPOSITION ZrC ZIRCONIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRC - SPUTTER DEPOSITION ZrF4 ZIRCONIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRF4 - SPUTTER DEPOSITION ZrO ZIRCONIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRO - SPUTTER DEPOSITION ZrO2 ZIRCONIUM DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRO2 - SPUTTER DEPOSITION ZrO2 -5 wt% CaO ZIRCONIUM OXIDE-CALCIA STAB. PHYSICAL VAPOR DEPOSITION - PVD - ZRO2 -5 WT% CAO - SPUTTER DEPOSITION ZrO2-Y2O3 ZIRCONIUM OXIDE YTTRIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRO2-Y2O3 - SPUTTER DEPOSITION ZrSi2 ZIRCONIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRSI2 - SPUTTER DEPOSITION PVD - SPUTTERING DEPOSITION - PHYSICAL VAPOR DEPOSITION - SPUTTERING THIN FILMS METALS ALLOYS DIELECTRICS DC RF MAGNETRON SPUTTER DEPOSITION AND REACTIVE SPUTTERING, (Cr)60(SiO)40 Chromium 60% - silicon monoxide 40%, (In2O3)80(SnO2)20 Indium oxide 80% - tin oxide 20%, (In2O3)85-(SnO2)15 Indium oxide 85% - tin oxide 15%, (In2O3)90-(SnO2)10 Indium oxide 90% - tin oxide 10%, (In2O3)91-(SnO2)9 Indium oxide 91 mol% - tin oxide 9 mol%, Ag Silver, Al Aluminum, Al2O3 Aluminum Oxide, Al98Cu2 Aluminum Copper 2%, Al96Cu4 Aluminum Copper 4%, Al99Si1 Aluminum Silicon 1%, AlF3 Aluminum Fluoride, AlN Aluminum Nitride, Al-Pr-Oxide Aluminum Praseodymium Oxide, As2S3 Arsen sulphur, Au Gold, B Boron, B4C Boron Carbide, B2O3 Boron Oxide, BaF2 Barium Fluoride, BaTiO3 Barium Titanate, Be Beryllium, BeO Beryllium Oxide, Bi Bismuth, Bi2O3 Bismuth Oxide, Bi4Ti3O12 Bismuth Titanate, BN Boron Nitride, C Carbon, CaF2 Calcium Fluoride, CaO Calcium Oxide, Cd Cadmium, CdS Cadmium Sulfide, CdSe Cadmium Selenide, CdTe Cadmium Telluride, Ce Cerium, CeF3 Cerium fluoride, CeO2 Cerium Oxide, Co Cobalt, Cr Chromium, Cr2C3 Chromium carbide, Cr3C2 Chromium carbide, Cr2O3 Chromium Oxide, CrB2 Chromium Boride, CrSi2 Chromium Silicide, Cr3Si Chromium Silicide, Cr2Si2 Chromium Silicide, Cr–SiO Chromium Silicon oxide, CsF Cesium Fluoride, CsI Cesium iodide, Cu Copper, Cu2O Copper dioxide, CuO Copper Oxide, Cu2Se Copper selenide, DyF3 Dysprosium fluoride, Dy2O3 Dysprosium oxide, ErF3 Erbium fluoride, Er2O3 Erbium Oxide, Eu2O3 Europium oxide, EuF3 Europium fluoride, Fe Iron, Fe2O3 Iron Oxide, Fe3O4 Iron oxide, Ga Gallium, GaP Gallium Phosoforide, Ga2O3 Gallium Oxide, GaAs Gallium Arsenide, Gd2O3 Gadolinium oxide, GdF3 Gadolinium fluoride, Ge Germanium, GeO2 Germanium Oxide, Ge2Sb2Te5 GST Germanium Antimony Tellurium, Hf Hafnium, HfB2 Hafnium boride, HfC Hafnium Carbide, HfF4 Hafnium fluoride, HfN Hafnium Nitride, HfO2 Hafnium Oxide, HfO2-Y2O3 Hafnium oxide 10-15t%, yttria stab., HfSi2 Hafnium silicide, Ho2O3 Holmium oxide, HoF3 Holmium fluoride, In Indium, In2O3 Indium Oxide, In2Se3 Indium selenide, In90Sn10 Indium - Tin, Ir Iridium, ITO Indium Tin Oxide, ITO-In2O3-SnO2 Indium Tin Oxide In2O3-SnO2, La-Nb-Oxide Lanthanum niobium oxide, La-Ti-Oxide Lanthanum titanium oxide, La2O3 Lanthanum Oxide, LaAlO3 Lanthanum Aluminate, LaB6 Lanthanum Boride, LaF3 Lanthanum fluoride, LiF Lithium fluoride, LiNbO3 Lithium Niobate, Lu2O3 Lutetium oxide, LuF3 Lutetium fluoride, Mg Magnesium, MgF2 Magnesium Fluoride, MgO Magnesium Oxide, Mn Manganese, MnS Manganese sulfide, Mo Molybdenum, Mo2C Molybdenum carbide, MoO3 Molybdenum Oxide, MoS2 Molybdenum Sulfide, MoSi2 Molybdenum Silicide, NaF Sodium fluoride, Na3AlF6 Sodium hexafluoroaluminate - Cryolite, Na5Al3F14 Sodium fluoroaluminate, Nb Niobium, NbC Niobium carbide, NbN Niobium nitride, Nb2O5 Niobium Oxide, NbSi2 Niobium silicide, NdF3 Neodymium fluoride, Nd2O3 Neodymium oxide, Ni Nickel, Ni80Cr20 Nickel 80 Chromium 20, Ni81Fe19 Nickel 81 Iron 19, Ni93V7 Nickel 93 Vanadium 7, NiCr Nickel Chromium, NiO Nickel Oxide, Os Osmium, Pb Lead, PbF2 Lead fluoride, PbO Lead Oxide, PbS Lead sulfide, PbSe Lead selenide, PbTe Lead telluride, Pd Palladium, Pr2O3 Praseodymium oxide, PrF3 Praseodymium fluoride, Pt Platinum, Rb Rubidium, Re Rhenium, Rh Rhodium, Ru Ruthenium, Sb Antimony, Sb2O3 Antimony Oxide, Sb2S3 Antimony sulfide, Sc2O3 Scandium Oxide, ScF3 Scandium fluoride, Se Selenium, Si Silicon, Si-Al-Oxide Silicon aluminate, Si3N4 Silicon Nitride, SiC Silicon Carbide, SiO Silicon Monoxide, SiO2 Silicon Dioxide, Sm2O3 Samarium oxide, SmF2 Samarium fluoride, Sn Tin, SnO Tin Oxide, SnO2 Tin dioxide, SrF2 Strontium fluoride, SrTiO3 Strontium Titanate, SrZrO3 Strontium zirconate, Ta Tantalum, Ta2O5 Tantalum Oxide, Ta2O5-X 0, TaC Tantalum Carbide, TaN Tantalum Nitride, TaSe2 Tantalum selenide, TaSi2 Tantalum Silicide, Ta5Si3 Tantalum silicide, Tb2O3 Terbium oxide, TbF3 Terbium fluoride, Te Tellurium, Th Thorium, ThF4 Thorium fluoride, ThO2 Thorium oxide, Ti Titanium, TiB2 Titanium Boride, TiC Titanium Carbide, TiN Titanium Nitride, TiO Titanium oxide, TiO2 Titanium dioxide, Ti2O3 Titanium trioxide, Ti3O5 Titanium pentoxide, TiSi2 Titanium Silicide, Ti-Al-Oxide Titanium aluminate, Ti5Si3 Titanium silicide, Ti-Pr-Oxide Titanium praseodymium oxide, U Uranium, UO2 Uranium oxide, V Vanadium, VC Vanadium carbide, V2O5 Vanadium Oxide, VSi2 Vanadium silicide, W Tungsten, W90Ti10 Tungsten 90 Titanium 10, WC Tungsten Carbide, W2C Tungsten IV Carbide, WO3 Tungsten oxide, WS2 Tungsten Sulfide, WSe2 Tungsten selenide, WSi2 Tungsten Silicide, WTi Tungsten Titanium, Y Yttrium, YF3 Yttrium fluoride, Y2O3 Yttrium Oxide, Yb2O3 Ytterbium oxide, YbF3 Ytterbium fluoride, Y-Ba-Fluoride Ytterbium barium fluoride, Yb-Ca-Fluoride Ytterbium calcium fluoride, YBCO Yttrium Barium Copper Oxide, Zn Zinc, ZnO Zinc Oxide, ZnO/Al2O3 Zinc Oxide / Aluminum Oxide, ZnS Zinc Sulfide, ZnSe Zinc Selenide, ZnTe Zinc Teluride, Zr Zirconium, ZrB2 Zirconium boride, ZrC Zirconium carbide, ZrF4 Zirconium fluoride, ZrO Zirconium Oxide, ZrO2 Zirconium dioxide, ZrO2 -5 wt% CaO Zirconium oxide-calcia stab., ZrO2-Y2O3 Zirconium Oxide Yttrium Oxide, ZrSi2 Zirconium silicide, PHYSICAL VAPOR DEPOSITION - METALS, ALLOYS, DIELECTRICS MAGNETRON SPUTTER DEPOSITION, DC , RF PVD REACTIVE SPUTTERING (Cr)60(SiO)40 CHROMIUM 60% - SILICON MONOXIDE 40% PHYSICAL VAPOR DEPOSITION - PVD - (CR)60(SIO)40 - SPUTTER DEPOSITION (In2O3)80(SnO2)20 INDIUM OXIDE 80% - TIN OXIDE 20% PHYSICAL VAPOR DEPOSITION - PVD - (IN2O3)80(SNO2)20 - SPUTTER DEPOSITION (In2O3)85-(SnO2)15 INDIUM OXIDE 85% - TIN OXIDE 15% PHYSICAL VAPOR DEPOSITION - PVD - (IN2O3)85-(SNO2)15 - SPUTTER DEPOSITION (In2O3)90-(SnO2)10 INDIUM OXIDE 90% - TIN OXIDE 10% PHYSICAL VAPOR DEPOSITION - PVD - (IN2O3)90-(SNO2)10 - SPUTTER DEPOSITION (In2O3)91-(SnO2)9 INDIUM OXIDE 91 MOL% - TIN OXIDE 9 MOL% PHYSICAL VAPOR DEPOSITION - PVD - (IN2O3)91-(SNO2)9 - SPUTTER DEPOSITION Ag SILVER PHYSICAL VAPOR DEPOSITION - PVD - AG - SPUTTER DEPOSITION Al ALUMINUM PHYSICAL VAPOR DEPOSITION - PVD - AL - SPUTTER DEPOSITION Al2O3 ALUMINUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - AL2O3 - SPUTTER DEPOSITION Al98Cu2 ALUMINUM COPPER 2% PHYSICAL VAPOR DEPOSITION - PVD - AL98CU2 - SPUTTER DEPOSITION Al96Cu4 ALUMINUM COPPER 4% PHYSICAL VAPOR DEPOSITION - PVD - AL96CU4 - SPUTTER DEPOSITION Al99Si1 ALUMINUM SILICON 1% PHYSICAL VAPOR DEPOSITION - PVD - AL99SI1 - SPUTTER DEPOSITION AlF3 ALUMINUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - ALF3 - SPUTTER DEPOSITION AlN ALUMINUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - ALN - SPUTTER DEPOSITION Al-Pr-Oxide ALUMINUM PRASEODYMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - AL-PR-OXIDE - SPUTTER DEPOSITION As2S3 ARSEN SULPHUR PHYSICAL VAPOR DEPOSITION - PVD - AS2S3 - SPUTTER DEPOSITION Au GOLD PHYSICAL VAPOR DEPOSITION - PVD - AU - SPUTTER DEPOSITION B BORON PHYSICAL VAPOR DEPOSITION - PVD - B - SPUTTER DEPOSITION B4C BORON CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - B4C - SPUTTER DEPOSITION B2O3 BORON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - B2O3 - SPUTTER DEPOSITION BaF2 BARIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - BAF2 - SPUTTER DEPOSITION BaTiO3 BARIUM TITANATE PHYSICAL VAPOR DEPOSITION - PVD - BATIO3 - SPUTTER DEPOSITION Be BERYLLIUM PHYSICAL VAPOR DEPOSITION - PVD - BE - SPUTTER DEPOSITION BeO BERYLLIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - BEO - SPUTTER DEPOSITION Bi BISMUTH PHYSICAL VAPOR DEPOSITION - PVD - BI - SPUTTER DEPOSITION Bi2O3 BISMUTH OXIDE PHYSICAL VAPOR DEPOSITION - PVD - BI2O3 - SPUTTER DEPOSITION Bi4Ti3O12 BISMUTH TITANATE PHYSICAL VAPOR DEPOSITION - PVD - BI4TI3O12 - SPUTTER DEPOSITION BN BORON NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - BN - SPUTTER DEPOSITION C CARBON PHYSICAL VAPOR DEPOSITION - PVD - C - SPUTTER DEPOSITION CaF2 CALCIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CAF2 - SPUTTER DEPOSITION CaO CALCIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CAO - SPUTTER DEPOSITION Cd CADMIUM PHYSICAL VAPOR DEPOSITION - PVD - CD - SPUTTER DEPOSITION CdS CADMIUM SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - CDS - SPUTTER DEPOSITION CdSe CADMIUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - CDSE - SPUTTER DEPOSITION CdTe CADMIUM TELLURIDE PHYSICAL VAPOR DEPOSITION - PVD - CDTE - SPUTTER DEPOSITION Ce CERIUM PHYSICAL VAPOR DEPOSITION - PVD - CE - SPUTTER DEPOSITION CeF3 CERIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CEF3 - SPUTTER DEPOSITION CeO2 CERIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CEO2 - SPUTTER DEPOSITION Co COBALT PHYSICAL VAPOR DEPOSITION - PVD - CO - SPUTTER DEPOSITION Cr CHROMIUM PHYSICAL VAPOR DEPOSITION - PVD - CR - SPUTTER DEPOSITION Cr2C3 CHROMIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - CR2C3 - SPUTTER DEPOSITION Cr3C2 CHROMIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - CR3C2 - SPUTTER DEPOSITION Cr2O3 CHROMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CR2O3 - SPUTTER DEPOSITION CrB2 CHROMIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - CRB2 - SPUTTER DEPOSITION CrSi2 CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CRSI2 - SPUTTER DEPOSITION Cr3Si CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CR3SI - SPUTTER DEPOSITION Cr2Si2 CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CR2SI2 - SPUTTER DEPOSITION Cr–SiO CHROMIUM SILICON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CR–SIO - SPUTTER DEPOSITION CsF CESIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CSF - SPUTTER DEPOSITION CsI CESIUM IODIDE PHYSICAL VAPOR DEPOSITION - PVD - CSI - SPUTTER DEPOSITION Cu COPPER PHYSICAL VAPOR DEPOSITION - PVD - CU - SPUTTER DEPOSITION Cu2O COPPER DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - CU2O - SPUTTER DEPOSITION CuO COPPER OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CUO - SPUTTER DEPOSITION Cu2Se COPPER SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - CU2SE - SPUTTER DEPOSITION DyF3 DYSPROSIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - DYF3 - SPUTTER DEPOSITION Dy2O3 DYSPROSIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - DY2O3 - SPUTTER DEPOSITION ErF3 ERBIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - ERF3 - SPUTTER DEPOSITION Er2O3 ERBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ER2O3 - SPUTTER DEPOSITION Eu2O3 EUROPIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - EU2O3 - SPUTTER DEPOSITION EuF3 EUROPIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - EUF3 - SPUTTER DEPOSITION Fe IRON PHYSICAL VAPOR DEPOSITION - PVD - FE - SPUTTER DEPOSITION Fe2O3 IRON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - FE2O3 - SPUTTER DEPOSITION Fe3O4 IRON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - FE3O4 - SPUTTER DEPOSITION Ga GALLIUM PHYSICAL VAPOR DEPOSITION - PVD - GA - SPUTTER DEPOSITION GaP GALLIUM PHOSOFORIDE PHYSICAL VAPOR DEPOSITION - PVD - GAP - SPUTTER DEPOSITION Ga2O3 GALLIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - GA2O3 - SPUTTER DEPOSITION GaAs GALLIUM ARSENIDE PHYSICAL VAPOR DEPOSITION - PVD - GAAS - SPUTTER DEPOSITION Gd2O3 GADOLINIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - GD2O3 - SPUTTER DEPOSITION GdF3 GADOLINIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - GDF3 - SPUTTER DEPOSITION Ge GERMANIUM PHYSICAL VAPOR DEPOSITION - PVD - GE - SPUTTER DEPOSITION GeO2 GERMANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - GEO2 - SPUTTER DEPOSITION Ge2Sb2Te5 GST GERMANIUM ANTIMONY TELLURIUM PHYSICAL VAPOR DEPOSITION - PVD - GE2SB2TE5 - SPUTTER DEPOSITION Hf HAFNIUM PHYSICAL VAPOR DEPOSITION - PVD - HF - SPUTTER DEPOSITION HfB2 HAFNIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - HFB2 - SPUTTER DEPOSITION HfC HAFNIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - HFC - SPUTTER DEPOSITION HfF4 HAFNIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - HFF4 - SPUTTER DEPOSITION HfN HAFNIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - HFN - SPUTTER DEPOSITION HfO2 HAFNIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - HFO2 - SPUTTER DEPOSITION HfO2-Y2O3 HAFNIUM OXIDE 10-15T%, YTTRIA STAB. PHYSICAL VAPOR DEPOSITION - PVD - HFO2-Y2O3 - SPUTTER DEPOSITION HfSi2 HAFNIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - HFSI2 - SPUTTER DEPOSITION Ho2O3 HOLMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - HO2O3 - SPUTTER DEPOSITION HoF3 HOLMIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - HOF3 - SPUTTER DEPOSITION In INDIUM PHYSICAL VAPOR DEPOSITION - PVD - IN - SPUTTER DEPOSITION In2O3 INDIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - IN2O3 - SPUTTER DEPOSITION In2Se3 INDIUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - IN2SE3 - SPUTTER DEPOSITION In90Sn10 INDIUM - TIN PHYSICAL VAPOR DEPOSITION - PVD - IN90SN10 - SPUTTER DEPOSITION Ir IRIDIUM PHYSICAL VAPOR DEPOSITION - PVD - IR - SPUTTER DEPOSITION ITO INDIUM TIN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ITO - SPUTTER DEPOSITION ITO-In2O3-SnO2 INDIUM TIN OXIDE IN2O3-SNO2 PHYSICAL VAPOR DEPOSITION - PVD - ITO-IN2O3-SNO2 - SPUTTER DEPOSITION La-Nb-Oxide LANTHANUM NIOBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LA-NB-OXIDE - SPUTTER DEPOSITION La-Ti-Oxide LANTHANUM TITANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LA-TI-OXIDE - SPUTTER DEPOSITION La2O3 LANTHANUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LA2O3 - SPUTTER DEPOSITION LaAlO3 LANTHANUM ALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - LAALO3 - SPUTTER DEPOSITION LaB6 LANTHANUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - LAB6 - SPUTTER DEPOSITION LaF3 LANTHANUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LAF3 - SPUTTER DEPOSITION LiF LITHIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LIF - SPUTTER DEPOSITION LiNbO3 LITHIUM NIOBATE PHYSICAL VAPOR DEPOSITION - PVD - LINBO3 - SPUTTER DEPOSITION Lu2O3 LUTETIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LU2O3 - SPUTTER DEPOSITION LuF3 LUTETIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LUF3 - SPUTTER DEPOSITION Mg MAGNESIUM PHYSICAL VAPOR DEPOSITION - PVD - MG - SPUTTER DEPOSITION MgF2 MAGNESIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - MGF2 - SPUTTER DEPOSITION MgO MAGNESIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - MGO - SPUTTER DEPOSITION Mn MANGANESE PHYSICAL VAPOR DEPOSITION - PVD - MN - SPUTTER DEPOSITION MnS MANGANESE SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - MNS - SPUTTER DEPOSITION Mo MOLYBDENUM PHYSICAL VAPOR DEPOSITION - PVD - MO - SPUTTER DEPOSITION Mo2C MOLYBDENUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - MO2C - SPUTTER DEPOSITION MoO3 MOLYBDENUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - MOO3 - SPUTTER DEPOSITION MoS2 MOLYBDENUM SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - MOS2 - SPUTTER DEPOSITION MoSi2 MOLYBDENUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - MOSI2 - SPUTTER DEPOSITION NaF SODIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - NAF - SPUTTER DEPOSITION Na3AlF6 SODIUM HEXAFLUOROALUMINATE - CRYOLITE PHYSICAL VAPOR DEPOSITION - PVD - NA3ALF6 - SPUTTER DEPOSITION Na5Al3F14 SODIUM FLUOROALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - NA5AL3F14 - SPUTTER DEPOSITION Nb NIOBIUM PHYSICAL VAPOR DEPOSITION - PVD - NB - SPUTTER DEPOSITION NbC NIOBIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - NBC - SPUTTER DEPOSITION NbN NIOBIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - NBN - SPUTTER DEPOSITION Nb2O5 NIOBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NB2O5 - SPUTTER DEPOSITION NbSi2 NIOBIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - NBSI2 - SPUTTER DEPOSITION NdF3 NEODYMIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - NDF3 - SPUTTER DEPOSITION Nd2O3 NEODYMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ND2O3 - SPUTTER DEPOSITION Ni NICKEL PHYSICAL VAPOR DEPOSITION - PVD - NI - SPUTTER DEPOSITION Ni80Cr20 NICKEL 80 CHROMIUM 20 PHYSICAL VAPOR DEPOSITION - PVD - NI80CR20 - SPUTTER DEPOSITION Ni81Fe19 NICKEL 81 IRON 19 PHYSICAL VAPOR DEPOSITION - PVD - NI81FE19 - SPUTTER DEPOSITION Ni93V7 NICKEL 93 VANADIUM 7 PHYSICAL VAPOR DEPOSITION - PVD - NI93V7 - SPUTTER DEPOSITION NiCr NICKEL CHROMIUM PHYSICAL VAPOR DEPOSITION - PVD - NICR - SPUTTER DEPOSITION NiO NICKEL OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NIO - SPUTTER DEPOSITION Os OSMIUM PHYSICAL VAPOR DEPOSITION - PVD - OS - SPUTTER DEPOSITION Pb LEAD PHYSICAL VAPOR DEPOSITION - PVD - PB - SPUTTER DEPOSITION PbF2 LEAD FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - PBF2 - SPUTTER DEPOSITION PbO LEAD OXIDE PHYSICAL VAPOR DEPOSITION - PVD - PBO - SPUTTER DEPOSITION PbS LEAD SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - PBS - SPUTTER DEPOSITION PbSe LEAD SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - PBSE - SPUTTER DEPOSITION PbTe LEAD TELLURIDE PHYSICAL VAPOR DEPOSITION - PVD - PBTE - SPUTTER DEPOSITION Pd PALLADIUM PHYSICAL VAPOR DEPOSITION - PVD - PD - SPUTTER DEPOSITION Pr2O3 PRASEODYMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - PR2O3 - SPUTTER DEPOSITION PrF3 PRASEODYMIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - PRF3 - SPUTTER DEPOSITION Pt PLATINUM PHYSICAL VAPOR DEPOSITION - PVD - PT - SPUTTER DEPOSITION Rb RUBIDIUM PHYSICAL VAPOR DEPOSITION - PVD - RB - SPUTTER DEPOSITION Re RHENIUM PHYSICAL VAPOR DEPOSITION - PVD - RE - SPUTTER DEPOSITION Rh RHODIUM PHYSICAL VAPOR DEPOSITION - PVD - RH - SPUTTER DEPOSITION Ru RUTHENIUM PHYSICAL VAPOR DEPOSITION - PVD - RU - SPUTTER DEPOSITION Sb ANTIMONY PHYSICAL VAPOR DEPOSITION - PVD - SB - SPUTTER DEPOSITION Sb2O3 ANTIMONY OXIDE PHYSICAL VAPOR DEPOSITION - PVD - SB2O3 - SPUTTER DEPOSITION Sb2S3 ANTIMONY SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - SB2S3 - SPUTTER DEPOSITION Sc2O3 SCANDIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - SC2O3 - SPUTTER DEPOSITION ScF3 SCANDIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - SCF3 - SPUTTER DEPOSITION Se SELENIUM PHYSICAL VAPOR DEPOSITION - PVD - SE - SPUTTER DEPOSITION Si SILICON PHYSICAL VAPOR DEPOSITION - PVD - SI - SPUTTER DEPOSITION Si-Al-Oxide SILICON ALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - SI-AL-OXIDE - SPUTTER DEPOSITION Si3N4 SILICON NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - SI3N4 - SPUTTER DEPOSITION SiC SILICON CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - SIC - SPUTTER DEPOSITION SiO SILICON MONOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SIO - SPUTTER DEPOSITION SiO2 SILICON DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SIO2 - SPUTTER DEPOSITION Sm2O3 SAMARIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - SM2O3 - SPUTTER DEPOSITION SmF2 SAMARIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - SMF2 - SPUTTER DEPOSITION Sn TIN PHYSICAL VAPOR DEPOSITION - PVD - SN - SPUTTER DEPOSITION SnO TIN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - SNO - SPUTTER DEPOSITION SnO2 TIN DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SNO2 - SPUTTER DEPOSITION SrF2 STRONTIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - SRF2 - SPUTTER DEPOSITION SrTiO3 STRONTIUM TITANATE PHYSICAL VAPOR DEPOSITION - PVD - SRTIO3 - SPUTTER DEPOSITION SrZrO3 STRONTIUM ZIRCONATE PHYSICAL VAPOR DEPOSITION - PVD - SRZRO3 - SPUTTER DEPOSITION Ta TANTALUM PHYSICAL VAPOR DEPOSITION - PVD - TA - SPUTTER DEPOSITION Ta2O5 TANTALUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TA2O5 - SPUTTER DEPOSITION Ta2O5-X 0 PHYSICAL VAPOR DEPOSITION - PVD - TA2O5-X - SPUTTER DEPOSITION TaC TANTALUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TAC - SPUTTER DEPOSITION TaN TANTALUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - TAN - SPUTTER DEPOSITION TaSe2 TANTALUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - TASE2 - SPUTTER DEPOSITION TaSi2 TANTALUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TASI2 - SPUTTER DEPOSITION Ta5Si3 TANTALUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TA5SI3 - SPUTTER DEPOSITION Tb2O3 TERBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TB2O3 - SPUTTER DEPOSITION TbF3 TERBIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - TBF3 - SPUTTER DEPOSITION Te TELLURIUM PHYSICAL VAPOR DEPOSITION - PVD - TE - SPUTTER DEPOSITION Th THORIUM PHYSICAL VAPOR DEPOSITION - PVD - TH - SPUTTER DEPOSITION ThF4 THORIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - THF4 - SPUTTER DEPOSITION ThO2 THORIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - THO2 - SPUTTER DEPOSITION Ti TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - TI - SPUTTER DEPOSITION TiB2 TITANIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - TIB2 - SPUTTER DEPOSITION TiC TITANIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TIC - SPUTTER DEPOSITION TiN TITANIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - TIN - SPUTTER DEPOSITION TiO TITANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TIO - SPUTTER DEPOSITION TiO2 TITANIUM DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - TIO2 - SPUTTER DEPOSITION Ti2O3 TITANIUM TRIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - TI2O3 - SPUTTER DEPOSITION Ti3O5 TITANIUM PENTOXIDE PHYSICAL VAPOR DEPOSITION - PVD - TI3O5 - SPUTTER DEPOSITION TiSi2 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TISI2 - SPUTTER DEPOSITION Ti-Al-Oxide TITANIUM ALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - TI-AL-OXIDE - SPUTTER DEPOSITION Ti5Si3 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TI5SI3 - SPUTTER DEPOSITION Ti-Pr-Oxide TITANIUM PRASEODYMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TI-PR-OXIDE - SPUTTER DEPOSITION U URANIUM PHYSICAL VAPOR DEPOSITION - PVD - U - SPUTTER DEPOSITION UO2 URANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - UO2 - SPUTTER DEPOSITION V VANADIUM PHYSICAL VAPOR DEPOSITION - PVD - V - SPUTTER DEPOSITION VC VANADIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - VC - SPUTTER DEPOSITION V2O5 VANADIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - V2O5 - SPUTTER DEPOSITION VSi2 VANADIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - VSI2 - SPUTTER DEPOSITION W TUNGSTEN PHYSICAL VAPOR DEPOSITION - PVD - W - SPUTTER DEPOSITION W90Ti10 TUNGSTEN 90 TITANIUM 10 PHYSICAL VAPOR DEPOSITION - PVD - W90TI10 - SPUTTER DEPOSITION WC TUNGSTEN CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - WC - SPUTTER DEPOSITION W2C TUNGSTEN IV CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - W2C - SPUTTER DEPOSITION WO3 TUNGSTEN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - WO3 - SPUTTER DEPOSITION WS2 TUNGSTEN SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - WS2 - SPUTTER DEPOSITION WSe2 TUNGSTEN SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - WSE2 - SPUTTER DEPOSITION WSi2 TUNGSTEN SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - WSI2 - SPUTTER DEPOSITION WTi TUNGSTEN TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - WTI - SPUTTER DEPOSITION Y YTTRIUM PHYSICAL VAPOR DEPOSITION - PVD - Y - SPUTTER DEPOSITION YF3 YTTRIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - YF3 - SPUTTER DEPOSITION Y2O3 YTTRIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - Y2O3 - SPUTTER DEPOSITION Yb2O3 YTTERBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - YB2O3 - SPUTTER DEPOSITION YbF3 YTTERBIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - YBF3 - SPUTTER DEPOSITION Y-Ba-Fluoride YTTERBIUM BARIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - Y-BA-FLUORIDE - SPUTTER DEPOSITION Yb-Ca-Fluoride YTTERBIUM CALCIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - YB-CA-FLUORIDE - SPUTTER DEPOSITION YBCO YTTRIUM BARIUM COPPER OXIDE PHYSICAL VAPOR DEPOSITION - PVD - YBCO - SPUTTER DEPOSITION Zn ZINC PHYSICAL VAPOR DEPOSITION - PVD - ZN - SPUTTER DEPOSITION ZnO ZINC OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNO - SPUTTER DEPOSITION ZnO/Al2O3 ZINC OXIDE / ALUMINUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNO/AL2O3 - SPUTTER DEPOSITION ZnS ZINC SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNS - SPUTTER DEPOSITION ZnSe ZINC SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNSE - SPUTTER DEPOSITION ZnTe ZINC TELURIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNTE - SPUTTER DEPOSITION Zr ZIRCONIUM PHYSICAL VAPOR DEPOSITION - PVD - ZR - SPUTTER DEPOSITION ZrB2 ZIRCONIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRB2 - SPUTTER DEPOSITION ZrC ZIRCONIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRC - SPUTTER DEPOSITION ZrF4 ZIRCONIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRF4 - SPUTTER DEPOSITION ZrO ZIRCONIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRO - SPUTTER DEPOSITION ZrO2 ZIRCONIUM DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRO2 - SPUTTER DEPOSITION ZrO2 -5 wt% CaO ZIRCONIUM OXIDE-CALCIA STAB. PHYSICAL VAPOR DEPOSITION - PVD - ZRO2 -5 WT% CAO - SPUTTER DEPOSITION ZrO2-Y2O3 ZIRCONIUM OXIDE YTTRIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRO2-Y2O3 - SPUTTER DEPOSITION ZrSi2 ZIRCONIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRSI2 - SPUTTER DEPOSITION HTE Labs logo PHYSICAL VAPOR DEPOSITION - METALS, ALLOYS, DIELECTRICS MAGNETRON SPUTTER DEPOSITION, DC , RF PVD REACTIVE SPUTTERING HTE Labs (Cr)60(SiO)40 CHROMIUM 60% - SILICON MONOXIDE 40% PHYSICAL VAPOR DEPOSITION - PVD - (CR)60(SIO)40 - SPUTTER DEPOSITION (In2O3)80(SnO2)20 INDIUM OXIDE 80% - TIN OXIDE 20% PHYSICAL VAPOR DEPOSITION - PVD - (IN2O3)80(SNO2)20 - SPUTTER DEPOSITION (In2O3)85-(SnO2)15 INDIUM OXIDE 85% - TIN OXIDE 15% PHYSICAL VAPOR DEPOSITION - PVD - (IN2O3)85-(SNO2)15 - SPUTTER DEPOSITION (In2O3)90-(SnO2)10 INDIUM OXIDE 90% - TIN OXIDE 10% PHYSICAL VAPOR DEPOSITION - PVD - (IN2O3)90-(SNO2)10 - SPUTTER DEPOSITION (In2O3)91-(SnO2)9 INDIUM OXIDE 91 MOL% - TIN OXIDE 9 MOL% PHYSICAL VAPOR DEPOSITION - PVD - (IN2O3)91-(SNO2)9 - SPUTTER DEPOSITION Ag SILVER PHYSICAL VAPOR DEPOSITION - PVD - AG - SPUTTER DEPOSITION Al ALUMINUM PHYSICAL VAPOR DEPOSITION - PVD - AL - SPUTTER DEPOSITION Al2O3 ALUMINUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - AL2O3 - SPUTTER DEPOSITION Al98Cu2 ALUMINUM COPPER 2% PHYSICAL VAPOR DEPOSITION - PVD - AL98CU2 - SPUTTER DEPOSITION Al96Cu4 ALUMINUM COPPER 4% PHYSICAL VAPOR DEPOSITION - PVD - AL96CU4 - SPUTTER DEPOSITION Al99Si1 ALUMINUM SILICON 1% PHYSICAL VAPOR DEPOSITION - PVD - AL99SI1 - SPUTTER DEPOSITION AlF3 ALUMINUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - ALF3 - SPUTTER DEPOSITION AlN ALUMINUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - ALN - SPUTTER DEPOSITION Al-Pr-Oxide ALUMINUM PRASEODYMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - AL-PR-OXIDE - SPUTTER DEPOSITION As2S3 ARSEN SULPHUR PHYSICAL VAPOR DEPOSITION - PVD - AS2S3 - SPUTTER DEPOSITION Au GOLD PHYSICAL VAPOR DEPOSITION - PVD - AU - SPUTTER DEPOSITION B BORON PHYSICAL VAPOR DEPOSITION - PVD - B - SPUTTER DEPOSITION B4C BORON CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - B4C - SPUTTER DEPOSITION B2O3 BORON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - B2O3 - SPUTTER DEPOSITION BaF2 BARIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - BAF2 - SPUTTER DEPOSITION BaTiO3 BARIUM TITANATE PHYSICAL VAPOR DEPOSITION - PVD - BATIO3 - SPUTTER DEPOSITION Be BERYLLIUM PHYSICAL VAPOR DEPOSITION - PVD - BE - SPUTTER DEPOSITION BeO BERYLLIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - BEO - SPUTTER DEPOSITION Bi BISMUTH PHYSICAL VAPOR DEPOSITION - PVD - BI - SPUTTER DEPOSITION Bi2O3 BISMUTH OXIDE PHYSICAL VAPOR DEPOSITION - PVD - BI2O3 - SPUTTER DEPOSITION Bi4Ti3O12 BISMUTH TITANATE PHYSICAL VAPOR DEPOSITION - PVD - BI4TI3O12 - SPUTTER DEPOSITION BN BORON NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - BN - SPUTTER DEPOSITION C CARBON PHYSICAL VAPOR DEPOSITION - PVD - C - SPUTTER DEPOSITION CaF2 CALCIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CAF2 - SPUTTER DEPOSITION CaO CALCIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CAO - SPUTTER DEPOSITION Cd CADMIUM PHYSICAL VAPOR DEPOSITION - PVD - CD - SPUTTER DEPOSITION CdS CADMIUM SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - CDS - SPUTTER DEPOSITION CdSe CADMIUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - CDSE - SPUTTER DEPOSITION CdTe CADMIUM TELLURIDE PHYSICAL VAPOR DEPOSITION - PVD - CDTE - SPUTTER DEPOSITION Ce CERIUM PHYSICAL VAPOR DEPOSITION - PVD - CE - SPUTTER DEPOSITION CeF3 CERIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CEF3 - SPUTTER DEPOSITION CeO2 CERIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CEO2 - SPUTTER DEPOSITION Co COBALT PHYSICAL VAPOR DEPOSITION - PVD - CO - SPUTTER DEPOSITION Cr CHROMIUM PHYSICAL VAPOR DEPOSITION - PVD - CR - SPUTTER DEPOSITION Cr2C3 CHROMIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - CR2C3 - SPUTTER DEPOSITION Cr3C2 CHROMIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - CR3C2 - SPUTTER DEPOSITION Cr2O3 CHROMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CR2O3 - SPUTTER DEPOSITION CrB2 CHROMIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - CRB2 - SPUTTER DEPOSITION CrSi2 CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CRSI2 - SPUTTER DEPOSITION Cr3Si CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CR3SI - SPUTTER DEPOSITION Cr2Si2 CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CR2SI2 - SPUTTER DEPOSITION Cr–SiO CHROMIUM SILICON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CR–SIO - SPUTTER DEPOSITION CsF CESIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CSF - SPUTTER DEPOSITION CsI CESIUM IODIDE PHYSICAL VAPOR DEPOSITION - PVD - CSI - SPUTTER DEPOSITION Cu COPPER PHYSICAL VAPOR DEPOSITION - PVD - CU - SPUTTER DEPOSITION Cu2O COPPER DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - CU2O - SPUTTER DEPOSITION CuO COPPER OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CUO - SPUTTER DEPOSITION Cu2Se COPPER SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - CU2SE - SPUTTER DEPOSITION DyF3 DYSPROSIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - DYF3 - SPUTTER DEPOSITION Dy2O3 DYSPROSIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - DY2O3 - SPUTTER DEPOSITION ErF3 ERBIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - ERF3 - SPUTTER DEPOSITION Er2O3 ERBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ER2O3 - SPUTTER DEPOSITION Eu2O3 EUROPIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - EU2O3 - SPUTTER DEPOSITION EuF3 EUROPIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - EUF3 - SPUTTER DEPOSITION Fe IRON PHYSICAL VAPOR DEPOSITION - PVD - FE - SPUTTER DEPOSITION Fe2O3 IRON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - FE2O3 - SPUTTER DEPOSITION Fe3O4 IRON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - FE3O4 - SPUTTER DEPOSITION Ga GALLIUM PHYSICAL VAPOR DEPOSITION - PVD - GA - SPUTTER DEPOSITION GaP GALLIUM PHOSOFORIDE PHYSICAL VAPOR DEPOSITION - PVD - GAP - SPUTTER DEPOSITION Ga2O3 GALLIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - GA2O3 - SPUTTER DEPOSITION GaAs GALLIUM ARSENIDE PHYSICAL VAPOR DEPOSITION - PVD - GAAS - SPUTTER DEPOSITION Gd2O3 GADOLINIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - GD2O3 - SPUTTER DEPOSITION GdF3 GADOLINIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - GDF3 - SPUTTER DEPOSITION Ge GERMANIUM PHYSICAL VAPOR DEPOSITION - PVD - GE - SPUTTER DEPOSITION GeO2 GERMANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - GEO2 - SPUTTER DEPOSITION Ge2Sb2Te5 GST GERMANIUM ANTIMONY TELLURIUM PHYSICAL VAPOR DEPOSITION - PVD - GE2SB2TE5 - SPUTTER DEPOSITION Hf HAFNIUM PHYSICAL VAPOR DEPOSITION - PVD - HF - SPUTTER DEPOSITION HfB2 HAFNIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - HFB2 - SPUTTER DEPOSITION HfC HAFNIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - HFC - SPUTTER DEPOSITION HfF4 HAFNIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - HFF4 - SPUTTER DEPOSITION HfN HAFNIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - HFN - SPUTTER DEPOSITION HfO2 HAFNIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - HFO2 - SPUTTER DEPOSITION HfO2-Y2O3 HAFNIUM OXIDE 10-15T%, YTTRIA STAB. PHYSICAL VAPOR DEPOSITION - PVD - HFO2-Y2O3 - SPUTTER DEPOSITION HfSi2 HAFNIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - HFSI2 - SPUTTER DEPOSITION Ho2O3 HOLMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - HO2O3 - SPUTTER DEPOSITION HoF3 HOLMIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - HOF3 - SPUTTER DEPOSITION In INDIUM PHYSICAL VAPOR DEPOSITION - PVD - IN - SPUTTER DEPOSITION In2O3 INDIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - IN2O3 - SPUTTER DEPOSITION In2Se3 INDIUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - IN2SE3 - SPUTTER DEPOSITION In90Sn10 INDIUM - TIN PHYSICAL VAPOR DEPOSITION - PVD - IN90SN10 - SPUTTER DEPOSITION Ir IRIDIUM PHYSICAL VAPOR DEPOSITION - PVD - IR - SPUTTER DEPOSITION ITO INDIUM TIN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ITO - SPUTTER DEPOSITION ITO-In2O3-SnO2 INDIUM TIN OXIDE IN2O3-SNO2 PHYSICAL VAPOR DEPOSITION - PVD - ITO-IN2O3-SNO2 - SPUTTER DEPOSITION La-Nb-Oxide LANTHANUM NIOBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LA-NB-OXIDE - SPUTTER DEPOSITION La-Ti-Oxide LANTHANUM TITANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LA-TI-OXIDE - SPUTTER DEPOSITION La2O3 LANTHANUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LA2O3 - SPUTTER DEPOSITION LaAlO3 LANTHANUM ALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - LAALO3 - SPUTTER DEPOSITION LaB6 LANTHANUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - LAB6 - SPUTTER DEPOSITION LaF3 LANTHANUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LAF3 - SPUTTER DEPOSITION LiF LITHIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LIF - SPUTTER DEPOSITION LiNbO3 LITHIUM NIOBATE PHYSICAL VAPOR DEPOSITION - PVD - LINBO3 - SPUTTER DEPOSITION Lu2O3 LUTETIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LU2O3 - SPUTTER DEPOSITION LuF3 LUTETIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LUF3 - SPUTTER DEPOSITION Mg MAGNESIUM PHYSICAL VAPOR DEPOSITION - PVD - MG - SPUTTER DEPOSITION MgF2 MAGNESIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - MGF2 - SPUTTER DEPOSITION MgO MAGNESIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - MGO - SPUTTER DEPOSITION Mn MANGANESE PHYSICAL VAPOR DEPOSITION - PVD - MN - SPUTTER DEPOSITION MnS MANGANESE SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - MNS - SPUTTER DEPOSITION Mo MOLYBDENUM PHYSICAL VAPOR DEPOSITION - PVD - MO - SPUTTER DEPOSITION Mo2C MOLYBDENUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - MO2C - SPUTTER DEPOSITION MoO3 MOLYBDENUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - MOO3 - SPUTTER DEPOSITION MoS2 MOLYBDENUM SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - MOS2 - SPUTTER DEPOSITION MoSi2 MOLYBDENUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - MOSI2 - SPUTTER DEPOSITION NaF SODIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - NAF - SPUTTER DEPOSITION Na3AlF6 SODIUM HEXAFLUOROALUMINATE - CRYOLITE PHYSICAL VAPOR DEPOSITION - PVD - NA3ALF6 - SPUTTER DEPOSITION Na5Al3F14 SODIUM FLUOROALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - NA5AL3F14 - SPUTTER DEPOSITION Nb NIOBIUM PHYSICAL VAPOR DEPOSITION - PVD - NB - SPUTTER DEPOSITION NbC NIOBIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - NBC - SPUTTER DEPOSITION NbN NIOBIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - NBN - SPUTTER DEPOSITION Nb2O5 NIOBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NB2O5 - SPUTTER DEPOSITION NbSi2 NIOBIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - NBSI2 - SPUTTER DEPOSITION NdF3 NEODYMIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - NDF3 - SPUTTER DEPOSITION Nd2O3 NEODYMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ND2O3 - SPUTTER DEPOSITION Ni NICKEL PHYSICAL VAPOR DEPOSITION - PVD - NI - SPUTTER DEPOSITION Ni80Cr20 NICKEL 80 CHROMIUM 20 PHYSICAL VAPOR DEPOSITION - PVD - NI80CR20 - SPUTTER DEPOSITION Ni81Fe19 NICKEL 81 IRON 19 PHYSICAL VAPOR DEPOSITION - PVD - NI81FE19 - SPUTTER DEPOSITION Ni93V7 NICKEL 93 VANADIUM 7 PHYSICAL VAPOR DEPOSITION - PVD - NI93V7 - SPUTTER DEPOSITION NiCr NICKEL CHROMIUM PHYSICAL VAPOR DEPOSITION - PVD - NICR - SPUTTER DEPOSITION NiO NICKEL OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NIO - SPUTTER DEPOSITION Os OSMIUM PHYSICAL VAPOR DEPOSITION - PVD - OS - SPUTTER DEPOSITION Pb LEAD PHYSICAL VAPOR DEPOSITION - PVD - PB - SPUTTER DEPOSITION PbF2 LEAD FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - PBF2 - SPUTTER DEPOSITION PbO LEAD OXIDE PHYSICAL VAPOR DEPOSITION - PVD - PBO - SPUTTER DEPOSITION PbS LEAD SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - PBS - SPUTTER DEPOSITION PbSe LEAD SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - PBSE - SPUTTER DEPOSITION PbTe LEAD TELLURIDE PHYSICAL VAPOR DEPOSITION - PVD - PBTE - SPUTTER DEPOSITION Pd PALLADIUM PHYSICAL VAPOR DEPOSITION - PVD - PD - SPUTTER DEPOSITION Pr2O3 PRASEODYMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - PR2O3 - SPUTTER DEPOSITION PrF3 PRASEODYMIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - PRF3 - SPUTTER DEPOSITION Pt PLATINUM PHYSICAL VAPOR DEPOSITION - PVD - PT - SPUTTER DEPOSITION Rb RUBIDIUM PHYSICAL VAPOR DEPOSITION - PVD - RB - SPUTTER DEPOSITION Re RHENIUM PHYSICAL VAPOR DEPOSITION - PVD - RE - SPUTTER DEPOSITION Rh RHODIUM PHYSICAL VAPOR DEPOSITION - PVD - RH - SPUTTER DEPOSITION Ru RUTHENIUM PHYSICAL VAPOR DEPOSITION - PVD - RU - SPUTTER DEPOSITION Sb ANTIMONY PHYSICAL VAPOR DEPOSITION - PVD - SB - SPUTTER DEPOSITION Sb2O3 ANTIMONY OXIDE PHYSICAL VAPOR DEPOSITION - PVD - SB2O3 - SPUTTER DEPOSITION Sb2S3 ANTIMONY SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - SB2S3 - SPUTTER DEPOSITION Sc2O3 SCANDIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - SC2O3 - SPUTTER DEPOSITION ScF3 SCANDIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - SCF3 - SPUTTER DEPOSITION Se SELENIUM PHYSICAL VAPOR DEPOSITION - PVD - SE - SPUTTER DEPOSITION Si SILICON PHYSICAL VAPOR DEPOSITION - PVD - SI - SPUTTER DEPOSITION Si-Al-Oxide SILICON ALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - SI-AL-OXIDE - SPUTTER DEPOSITION Si3N4 SILICON NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - SI3N4 - SPUTTER DEPOSITION SiC SILICON CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - SIC - SPUTTER DEPOSITION SiO SILICON MONOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SIO - SPUTTER DEPOSITION SiO2 SILICON DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SIO2 - SPUTTER DEPOSITION Sm2O3 SAMARIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - SM2O3 - SPUTTER DEPOSITION SmF2 SAMARIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - SMF2 - SPUTTER DEPOSITION Sn TIN PHYSICAL VAPOR DEPOSITION - PVD - SN - SPUTTER DEPOSITION SnO TIN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - SNO - SPUTTER DEPOSITION SnO2 TIN DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SNO2 - SPUTTER DEPOSITION SrF2 STRONTIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - SRF2 - SPUTTER DEPOSITION SrTiO3 STRONTIUM TITANATE PHYSICAL VAPOR DEPOSITION - PVD - SRTIO3 - SPUTTER DEPOSITION SrZrO3 STRONTIUM ZIRCONATE PHYSICAL VAPOR DEPOSITION - PVD - SRZRO3 - SPUTTER DEPOSITION Ta TANTALUM PHYSICAL VAPOR DEPOSITION - PVD - TA - SPUTTER DEPOSITION Ta2O5 TANTALUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TA2O5 - SPUTTER DEPOSITION Ta2O5-X 0 PHYSICAL VAPOR DEPOSITION - PVD - TA2O5-X - SPUTTER DEPOSITION TaC TANTALUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TAC - SPUTTER DEPOSITION TaN TANTALUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - TAN - SPUTTER DEPOSITION TaSe2 TANTALUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - TASE2 - SPUTTER DEPOSITION TaSi2 TANTALUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TASI2 - SPUTTER DEPOSITION Ta5Si3 TANTALUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TA5SI3 - SPUTTER DEPOSITION Tb2O3 TERBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TB2O3 - SPUTTER DEPOSITION TbF3 TERBIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - TBF3 - SPUTTER DEPOSITION Te TELLURIUM PHYSICAL VAPOR DEPOSITION - PVD - TE - SPUTTER DEPOSITION Th THORIUM PHYSICAL VAPOR DEPOSITION - PVD - TH - SPUTTER DEPOSITION ThF4 THORIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - THF4 - SPUTTER DEPOSITION ThO2 THORIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - THO2 - SPUTTER DEPOSITION Ti TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - TI - SPUTTER DEPOSITION TiB2 TITANIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - TIB2 - SPUTTER DEPOSITION TiC TITANIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TIC - SPUTTER DEPOSITION TiN TITANIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - TIN - SPUTTER DEPOSITION TiO TITANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TIO - SPUTTER DEPOSITION TiO2 TITANIUM DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - TIO2 - SPUTTER DEPOSITION Ti2O3 TITANIUM TRIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - TI2O3 - SPUTTER DEPOSITION Ti3O5 TITANIUM PENTOXIDE PHYSICAL VAPOR DEPOSITION - PVD - TI3O5 - SPUTTER DEPOSITION TiSi2 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TISI2 - SPUTTER DEPOSITION Ti-Al-Oxide TITANIUM ALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - TI-AL-OXIDE - SPUTTER DEPOSITION Ti5Si3 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TI5SI3 - SPUTTER DEPOSITION Ti-Pr-Oxide TITANIUM PRASEODYMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TI-PR-OXIDE - SPUTTER DEPOSITION U URANIUM PHYSICAL VAPOR DEPOSITION - PVD - U - SPUTTER DEPOSITION UO2 URANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - UO2 - SPUTTER DEPOSITION V VANADIUM PHYSICAL VAPOR DEPOSITION - PVD - V - SPUTTER DEPOSITION VC VANADIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - VC - SPUTTER DEPOSITION V2O5 VANADIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - V2O5 - SPUTTER DEPOSITION VSi2 VANADIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - VSI2 - SPUTTER DEPOSITION W TUNGSTEN PHYSICAL VAPOR DEPOSITION - PVD - W - SPUTTER DEPOSITION W90Ti10 TUNGSTEN 90 TITANIUM 10 PHYSICAL VAPOR DEPOSITION - PVD - W90TI10 - SPUTTER DEPOSITION WC TUNGSTEN CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - WC - SPUTTER DEPOSITION W2C TUNGSTEN IV CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - W2C - SPUTTER DEPOSITION WO3 TUNGSTEN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - WO3 - SPUTTER DEPOSITION WS2 TUNGSTEN SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - WS2 - SPUTTER DEPOSITION WSe2 TUNGSTEN SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - WSE2 - SPUTTER DEPOSITION WSi2 TUNGSTEN SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - WSI2 - SPUTTER DEPOSITION WTi TUNGSTEN TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - WTI - SPUTTER DEPOSITION Y YTTRIUM PHYSICAL VAPOR DEPOSITION - PVD - Y - SPUTTER DEPOSITION YF3 YTTRIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - YF3 - SPUTTER DEPOSITION Y2O3 YTTRIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - Y2O3 - SPUTTER DEPOSITION Yb2O3 YTTERBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - YB2O3 - SPUTTER DEPOSITION YbF3 YTTERBIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - YBF3 - SPUTTER DEPOSITION Y-Ba-Fluoride YTTERBIUM BARIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - Y-BA-FLUORIDE - SPUTTER DEPOSITION Yb-Ca-Fluoride YTTERBIUM CALCIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - YB-CA-FLUORIDE - SPUTTER DEPOSITION YBCO YTTRIUM BARIUM COPPER OXIDE PHYSICAL VAPOR DEPOSITION - PVD - YBCO - SPUTTER DEPOSITION Zn ZINC PHYSICAL VAPOR DEPOSITION - PVD - ZN - SPUTTER DEPOSITION ZnO ZINC OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNO - SPUTTER DEPOSITION ZnO/Al2O3 ZINC OXIDE / ALUMINUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNO/AL2O3 - SPUTTER DEPOSITION ZnS ZINC SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNS - SPUTTER DEPOSITION ZnSe ZINC SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNSE - SPUTTER DEPOSITION ZnTe ZINC TELURIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNTE - SPUTTER DEPOSITION Zr ZIRCONIUM PHYSICAL VAPOR DEPOSITION - PVD - ZR - SPUTTER DEPOSITION ZrB2 ZIRCONIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRB2 - SPUTTER DEPOSITION ZrC ZIRCONIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRC - SPUTTER DEPOSITION ZrF4 ZIRCONIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRF4 - SPUTTER DEPOSITION ZrO ZIRCONIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRO - SPUTTER DEPOSITION ZrO2 ZIRCONIUM DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRO2 - SPUTTER DEPOSITION ZrO2 -5 wt% CaO ZIRCONIUM OXIDE-CALCIA STAB. PHYSICAL VAPOR DEPOSITION - PVD - ZRO2 -5 WT% CAO - SPUTTER DEPOSITION ZrO2-Y2O3 ZIRCONIUM OXIDE YTTRIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRO2-Y2O3 - SPUTTER DEPOSITION ZrSi2 ZIRCONIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRSI2 - SPUTTER DEPOSITION Home>PVD REACTIVE SPUTTERING> Last updated:
 
 
PHYSICAL VAPOR DEPOSITION - METALS, ALLOYS, DIELECTRICS
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PVD REACTIVE SPUTTERING
 
 

(Cr)60(SiO)40 CHROMIUM 60% - SILICON MONOXIDE 40% PHYSICAL VAPOR DEPOSITION - PVD - (CR)60(SIO)40 - SPUTTER DEPOSITION
(In2O3)80(SnO2)20 INDIUM OXIDE 80% - TIN OXIDE 20% PHYSICAL VAPOR DEPOSITION - PVD - (IN2O3)80(SNO2)20 - SPUTTER DEPOSITION
(In2O3)85-(SnO2)15 INDIUM OXIDE 85% - TIN OXIDE 15% PHYSICAL VAPOR DEPOSITION - PVD - (IN2O3)85-(SNO2)15 - SPUTTER DEPOSITION
(In2O3)90-(SnO2)10 INDIUM OXIDE 90% - TIN OXIDE 10% PHYSICAL VAPOR DEPOSITION - PVD - (IN2O3)90-(SNO2)10 - SPUTTER DEPOSITION
(In2O3)91-(SnO2)9 INDIUM OXIDE 91 MOL% - TIN OXIDE 9 MOL% PHYSICAL VAPOR DEPOSITION - PVD - (IN2O3)91-(SNO2)9 - SPUTTER DEPOSITION
Ag SILVER PHYSICAL VAPOR DEPOSITION - PVD - AG - SPUTTER DEPOSITION
Al ALUMINUM PHYSICAL VAPOR DEPOSITION - PVD - AL - SPUTTER DEPOSITION
Al2O3 ALUMINUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - AL2O3 - SPUTTER DEPOSITION
Al98Cu2 ALUMINUM COPPER 2% PHYSICAL VAPOR DEPOSITION - PVD - AL98CU2 - SPUTTER DEPOSITION
Al96Cu4 ALUMINUM COPPER 4% PHYSICAL VAPOR DEPOSITION - PVD - AL96CU4 - SPUTTER DEPOSITION
Al99Si1 ALUMINUM SILICON 1% PHYSICAL VAPOR DEPOSITION - PVD - AL99SI1 - SPUTTER DEPOSITION
AlF3 ALUMINUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - ALF3 - SPUTTER DEPOSITION
AlN ALUMINUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - ALN - SPUTTER DEPOSITION
Al-Pr-Oxide ALUMINUM PRASEODYMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - AL-PR-OXIDE - SPUTTER DEPOSITION
As2S3 ARSEN SULPHUR PHYSICAL VAPOR DEPOSITION - PVD - AS2S3 - SPUTTER DEPOSITION
Au GOLD PHYSICAL VAPOR DEPOSITION - PVD - AU - SPUTTER DEPOSITION
B BORON PHYSICAL VAPOR DEPOSITION - PVD - B - SPUTTER DEPOSITION
B4C BORON CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - B4C - SPUTTER DEPOSITION
B2O3 BORON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - B2O3 - SPUTTER DEPOSITION
BaF2 BARIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - BAF2 - SPUTTER DEPOSITION
BaTiO3 BARIUM TITANATE PHYSICAL VAPOR DEPOSITION - PVD - BATIO3 - SPUTTER DEPOSITION
Be BERYLLIUM PHYSICAL VAPOR DEPOSITION - PVD - BE - SPUTTER DEPOSITION
BeO BERYLLIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - BEO - SPUTTER DEPOSITION
Bi BISMUTH PHYSICAL VAPOR DEPOSITION - PVD - BI - SPUTTER DEPOSITION
Bi2O3 BISMUTH OXIDE PHYSICAL VAPOR DEPOSITION - PVD - BI2O3 - SPUTTER DEPOSITION
Bi4Ti3O12 BISMUTH TITANATE PHYSICAL VAPOR DEPOSITION - PVD - BI4TI3O12 - SPUTTER DEPOSITION
BN BORON NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - BN - SPUTTER DEPOSITION
C CARBON PHYSICAL VAPOR DEPOSITION - PVD - C - SPUTTER DEPOSITION
CaF2 CALCIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CAF2 - SPUTTER DEPOSITION
CaO CALCIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CAO - SPUTTER DEPOSITION
Cd CADMIUM PHYSICAL VAPOR DEPOSITION - PVD - CD - SPUTTER DEPOSITION
CdS CADMIUM SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - CDS - SPUTTER DEPOSITION
CdSe CADMIUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - CDSE - SPUTTER DEPOSITION
CdTe CADMIUM TELLURIDE PHYSICAL VAPOR DEPOSITION - PVD - CDTE - SPUTTER DEPOSITION
Ce CERIUM PHYSICAL VAPOR DEPOSITION - PVD - CE - SPUTTER DEPOSITION
CeF3 CERIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CEF3 - SPUTTER DEPOSITION
CeO2 CERIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CEO2 - SPUTTER DEPOSITION
Co COBALT PHYSICAL VAPOR DEPOSITION - PVD - CO - SPUTTER DEPOSITION
Cr CHROMIUM PHYSICAL VAPOR DEPOSITION - PVD - CR - SPUTTER DEPOSITION
Cr2C3 CHROMIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - CR2C3 - SPUTTER DEPOSITION
Cr3C2 CHROMIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - CR3C2 - SPUTTER DEPOSITION
Cr2O3 CHROMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CR2O3 - SPUTTER DEPOSITION
CrB2 CHROMIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - CRB2 - SPUTTER DEPOSITION
CrSi2 CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CRSI2 - SPUTTER DEPOSITION
Cr3Si CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CR3SI - SPUTTER DEPOSITION
Cr2Si2 CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CR2SI2 - SPUTTER DEPOSITION
Cr–SiO CHROMIUM SILICON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CR–SIO - SPUTTER DEPOSITION
CsF CESIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CSF - SPUTTER DEPOSITION
CsI CESIUM IODIDE PHYSICAL VAPOR DEPOSITION - PVD - CSI - SPUTTER DEPOSITION
Cu COPPER PHYSICAL VAPOR DEPOSITION - PVD - CU - SPUTTER DEPOSITION
Cu2O COPPER DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - CU2O - SPUTTER DEPOSITION
CuO COPPER OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CUO - SPUTTER DEPOSITION
Cu2Se COPPER SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - CU2SE - SPUTTER DEPOSITION
DyF3 DYSPROSIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - DYF3 - SPUTTER DEPOSITION
Dy2O3 DYSPROSIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - DY2O3 - SPUTTER DEPOSITION
ErF3 ERBIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - ERF3 - SPUTTER DEPOSITION
Er2O3 ERBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ER2O3 - SPUTTER DEPOSITION
Eu2O3 EUROPIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - EU2O3 - SPUTTER DEPOSITION
EuF3 EUROPIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - EUF3 - SPUTTER DEPOSITION
Fe IRON PHYSICAL VAPOR DEPOSITION - PVD - FE - SPUTTER DEPOSITION
Fe2O3 IRON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - FE2O3 - SPUTTER DEPOSITION
Fe3O4 IRON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - FE3O4 - SPUTTER DEPOSITION
Ga GALLIUM PHYSICAL VAPOR DEPOSITION - PVD - GA - SPUTTER DEPOSITION
GaP GALLIUM PHOSOFORIDE PHYSICAL VAPOR DEPOSITION - PVD - GAP - SPUTTER DEPOSITION
Ga2O3 GALLIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - GA2O3 - SPUTTER DEPOSITION
GaAs GALLIUM ARSENIDE PHYSICAL VAPOR DEPOSITION - PVD - GAAS - SPUTTER DEPOSITION
Gd2O3 GADOLINIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - GD2O3 - SPUTTER DEPOSITION
GdF3 GADOLINIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - GDF3 - SPUTTER DEPOSITION
Ge GERMANIUM PHYSICAL VAPOR DEPOSITION - PVD - GE - SPUTTER DEPOSITION
GeO2 GERMANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - GEO2 - SPUTTER DEPOSITION
Ge2Sb2Te5 GST GERMANIUM ANTIMONY TELLURIUM PHYSICAL VAPOR DEPOSITION - PVD - GE2SB2TE5 - SPUTTER DEPOSITION
Hf HAFNIUM PHYSICAL VAPOR DEPOSITION - PVD - HF - SPUTTER DEPOSITION
HfB2 HAFNIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - HFB2 - SPUTTER DEPOSITION
HfC HAFNIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - HFC - SPUTTER DEPOSITION
HfF4 HAFNIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - HFF4 - SPUTTER DEPOSITION
HfN HAFNIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - HFN - SPUTTER DEPOSITION
HfO2 HAFNIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - HFO2 - SPUTTER DEPOSITION
HfO2-Y2O3 HAFNIUM OXIDE 10-15T%, YTTRIA STAB. PHYSICAL VAPOR DEPOSITION - PVD - HFO2-Y2O3 - SPUTTER DEPOSITION
HfSi2 HAFNIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - HFSI2 - SPUTTER DEPOSITION
Ho2O3 HOLMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - HO2O3 - SPUTTER DEPOSITION
HoF3 HOLMIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - HOF3 - SPUTTER DEPOSITION
In INDIUM PHYSICAL VAPOR DEPOSITION - PVD - IN - SPUTTER DEPOSITION
In2O3 INDIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - IN2O3 - SPUTTER DEPOSITION
In2Se3 INDIUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - IN2SE3 - SPUTTER DEPOSITION
In90Sn10 INDIUM - TIN PHYSICAL VAPOR DEPOSITION - PVD - IN90SN10 - SPUTTER DEPOSITION
Ir IRIDIUM PHYSICAL VAPOR DEPOSITION - PVD - IR - SPUTTER DEPOSITION
ITO INDIUM TIN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ITO - SPUTTER DEPOSITION
ITO-In2O3-SnO2 INDIUM TIN OXIDE IN2O3-SNO2 PHYSICAL VAPOR DEPOSITION - PVD - ITO-IN2O3-SNO2 - SPUTTER DEPOSITION
La-Nb-Oxide LANTHANUM NIOBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LA-NB-OXIDE - SPUTTER DEPOSITION
La-Ti-Oxide LANTHANUM TITANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LA-TI-OXIDE - SPUTTER DEPOSITION
La2O3 LANTHANUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LA2O3 - SPUTTER DEPOSITION
LaAlO3 LANTHANUM ALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - LAALO3 - SPUTTER DEPOSITION
LaB6 LANTHANUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - LAB6 - SPUTTER DEPOSITION
LaF3 LANTHANUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LAF3 - SPUTTER DEPOSITION
LiF LITHIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LIF - SPUTTER DEPOSITION
LiNbO3 LITHIUM NIOBATE PHYSICAL VAPOR DEPOSITION - PVD - LINBO3 - SPUTTER DEPOSITION
Lu2O3 LUTETIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LU2O3 - SPUTTER DEPOSITION
LuF3 LUTETIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LUF3 - SPUTTER DEPOSITION
Mg MAGNESIUM PHYSICAL VAPOR DEPOSITION - PVD - MG - SPUTTER DEPOSITION
MgF2 MAGNESIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - MGF2 - SPUTTER DEPOSITION
MgO MAGNESIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - MGO - SPUTTER DEPOSITION
Mn MANGANESE PHYSICAL VAPOR DEPOSITION - PVD - MN - SPUTTER DEPOSITION
MnS MANGANESE SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - MNS - SPUTTER DEPOSITION
Mo MOLYBDENUM PHYSICAL VAPOR DEPOSITION - PVD - MO - SPUTTER DEPOSITION
Mo2C MOLYBDENUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - MO2C - SPUTTER DEPOSITION
MoO3 MOLYBDENUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - MOO3 - SPUTTER DEPOSITION
MoS2 MOLYBDENUM SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - MOS2 - SPUTTER DEPOSITION
MoSi2 MOLYBDENUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - MOSI2 - SPUTTER DEPOSITION
NaF SODIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - NAF - SPUTTER DEPOSITION
Na3AlF6 SODIUM HEXAFLUOROALUMINATE - CRYOLITE PHYSICAL VAPOR DEPOSITION - PVD - NA3ALF6 - SPUTTER DEPOSITION
Na5Al3F14 SODIUM FLUOROALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - NA5AL3F14 - SPUTTER DEPOSITION
Nb NIOBIUM PHYSICAL VAPOR DEPOSITION - PVD - NB - SPUTTER DEPOSITION
NbC NIOBIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - NBC - SPUTTER DEPOSITION
NbN NIOBIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - NBN - SPUTTER DEPOSITION
Nb2O5 NIOBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NB2O5 - SPUTTER DEPOSITION
NbSi2 NIOBIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - NBSI2 - SPUTTER DEPOSITION
NdF3 NEODYMIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - NDF3 - SPUTTER DEPOSITION
Nd2O3 NEODYMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ND2O3 - SPUTTER DEPOSITION
Ni NICKEL PHYSICAL VAPOR DEPOSITION - PVD - NI - SPUTTER DEPOSITION
Ni80Cr20 NICKEL 80 CHROMIUM 20 PHYSICAL VAPOR DEPOSITION - PVD - NI80CR20 - SPUTTER DEPOSITION
Ni81Fe19 NICKEL 81 IRON 19 PHYSICAL VAPOR DEPOSITION - PVD - NI81FE19 - SPUTTER DEPOSITION
Ni93V7 NICKEL 93 VANADIUM 7 PHYSICAL VAPOR DEPOSITION - PVD - NI93V7 - SPUTTER DEPOSITION
NiCr NICKEL CHROMIUM PHYSICAL VAPOR DEPOSITION - PVD - NICR - SPUTTER DEPOSITION
NiO NICKEL OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NIO - SPUTTER DEPOSITION
Os OSMIUM PHYSICAL VAPOR DEPOSITION - PVD - OS - SPUTTER DEPOSITION
Pb LEAD PHYSICAL VAPOR DEPOSITION - PVD - PB - SPUTTER DEPOSITION
PbF2 LEAD FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - PBF2 - SPUTTER DEPOSITION
PbO LEAD OXIDE PHYSICAL VAPOR DEPOSITION - PVD - PBO - SPUTTER DEPOSITION
PbS LEAD SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - PBS - SPUTTER DEPOSITION
PbSe LEAD SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - PBSE - SPUTTER DEPOSITION
PbTe LEAD TELLURIDE PHYSICAL VAPOR DEPOSITION - PVD - PBTE - SPUTTER DEPOSITION
Pd PALLADIUM PHYSICAL VAPOR DEPOSITION - PVD - PD - SPUTTER DEPOSITION
Pr2O3 PRASEODYMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - PR2O3 - SPUTTER DEPOSITION
PrF3 PRASEODYMIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - PRF3 - SPUTTER DEPOSITION
Pt PLATINUM PHYSICAL VAPOR DEPOSITION - PVD - PT - SPUTTER DEPOSITION
Rb RUBIDIUM PHYSICAL VAPOR DEPOSITION - PVD - RB - SPUTTER DEPOSITION
Re RHENIUM PHYSICAL VAPOR DEPOSITION - PVD - RE - SPUTTER DEPOSITION
Rh RHODIUM PHYSICAL VAPOR DEPOSITION - PVD - RH - SPUTTER DEPOSITION
Ru RUTHENIUM PHYSICAL VAPOR DEPOSITION - PVD - RU - SPUTTER DEPOSITION
Sb ANTIMONY PHYSICAL VAPOR DEPOSITION - PVD - SB - SPUTTER DEPOSITION
Sb2O3 ANTIMONY OXIDE PHYSICAL VAPOR DEPOSITION - PVD - SB2O3 - SPUTTER DEPOSITION
Sb2S3 ANTIMONY SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - SB2S3 - SPUTTER DEPOSITION
Sc2O3 SCANDIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - SC2O3 - SPUTTER DEPOSITION
ScF3 SCANDIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - SCF3 - SPUTTER DEPOSITION
Se SELENIUM PHYSICAL VAPOR DEPOSITION - PVD - SE - SPUTTER DEPOSITION
Si SILICON PHYSICAL VAPOR DEPOSITION - PVD - SI - SPUTTER DEPOSITION
Si-Al-Oxide SILICON ALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - SI-AL-OXIDE - SPUTTER DEPOSITION
Si3N4 SILICON NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - SI3N4 - SPUTTER DEPOSITION
SiC SILICON CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - SIC - SPUTTER DEPOSITION
SiO SILICON MONOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SIO - SPUTTER DEPOSITION
SiO2 SILICON DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SIO2 - SPUTTER DEPOSITION
Sm2O3 SAMARIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - SM2O3 - SPUTTER DEPOSITION
SmF2 SAMARIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - SMF2 - SPUTTER DEPOSITION
Sn TIN PHYSICAL VAPOR DEPOSITION - PVD - SN - SPUTTER DEPOSITION
SnO TIN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - SNO - SPUTTER DEPOSITION
SnO2 TIN DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SNO2 - SPUTTER DEPOSITION
SrF2 STRONTIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - SRF2 - SPUTTER DEPOSITION
SrTiO3 STRONTIUM TITANATE PHYSICAL VAPOR DEPOSITION - PVD - SRTIO3 - SPUTTER DEPOSITION
SrZrO3 STRONTIUM ZIRCONATE PHYSICAL VAPOR DEPOSITION - PVD - SRZRO3 - SPUTTER DEPOSITION
Ta TANTALUM PHYSICAL VAPOR DEPOSITION - PVD - TA - SPUTTER DEPOSITION
Ta2O5 TANTALUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TA2O5 - SPUTTER DEPOSITION
Ta2O5-X 0 PHYSICAL VAPOR DEPOSITION - PVD - TA2O5-X - SPUTTER DEPOSITION
TaC TANTALUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TAC - SPUTTER DEPOSITION
TaN TANTALUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - TAN - SPUTTER DEPOSITION
TaSe2 TANTALUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - TASE2 - SPUTTER DEPOSITION
TaSi2 TANTALUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TASI2 - SPUTTER DEPOSITION
Ta5Si3 TANTALUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TA5SI3 - SPUTTER DEPOSITION
Tb2O3 TERBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TB2O3 - SPUTTER DEPOSITION
TbF3 TERBIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - TBF3 - SPUTTER DEPOSITION
Te TELLURIUM PHYSICAL VAPOR DEPOSITION - PVD - TE - SPUTTER DEPOSITION
Th THORIUM PHYSICAL VAPOR DEPOSITION - PVD - TH - SPUTTER DEPOSITION
ThF4 THORIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - THF4 - SPUTTER DEPOSITION
ThO2 THORIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - THO2 - SPUTTER DEPOSITION
Ti TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - TI - SPUTTER DEPOSITION
TiB2 TITANIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - TIB2 - SPUTTER DEPOSITION
TiC TITANIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TIC - SPUTTER DEPOSITION
TiN TITANIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - TIN - SPUTTER DEPOSITION
TiO TITANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TIO - SPUTTER DEPOSITION
TiO2 TITANIUM DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - TIO2 - SPUTTER DEPOSITION
Ti2O3 TITANIUM TRIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - TI2O3 - SPUTTER DEPOSITION
Ti3O5 TITANIUM PENTOXIDE PHYSICAL VAPOR DEPOSITION - PVD - TI3O5 - SPUTTER DEPOSITION
TiSi2 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TISI2 - SPUTTER DEPOSITION
Ti-Al-Oxide TITANIUM ALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - TI-AL-OXIDE - SPUTTER DEPOSITION
Ti5Si3 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TI5SI3 - SPUTTER DEPOSITION
Ti-Pr-Oxide TITANIUM PRASEODYMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TI-PR-OXIDE - SPUTTER DEPOSITION
U URANIUM PHYSICAL VAPOR DEPOSITION - PVD - U - SPUTTER DEPOSITION
UO2 URANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - UO2 - SPUTTER DEPOSITION
V VANADIUM PHYSICAL VAPOR DEPOSITION - PVD - V - SPUTTER DEPOSITION
VC VANADIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - VC - SPUTTER DEPOSITION
V2O5 VANADIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - V2O5 - SPUTTER DEPOSITION
VSi2 VANADIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - VSI2 - SPUTTER DEPOSITION
W TUNGSTEN PHYSICAL VAPOR DEPOSITION - PVD - W - SPUTTER DEPOSITION
W90Ti10 TUNGSTEN 90 TITANIUM 10 PHYSICAL VAPOR DEPOSITION - PVD - W90TI10 - SPUTTER DEPOSITION
WC TUNGSTEN CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - WC - SPUTTER DEPOSITION
W2C TUNGSTEN IV CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - W2C - SPUTTER DEPOSITION
WO3 TUNGSTEN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - WO3 - SPUTTER DEPOSITION
WS2 TUNGSTEN SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - WS2 - SPUTTER DEPOSITION
WSe2 TUNGSTEN SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - WSE2 - SPUTTER DEPOSITION
WSi2 TUNGSTEN SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - WSI2 - SPUTTER DEPOSITION
WTi TUNGSTEN TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - WTI - SPUTTER DEPOSITION
Y YTTRIUM PHYSICAL VAPOR DEPOSITION - PVD - Y - SPUTTER DEPOSITION
YF3 YTTRIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - YF3 - SPUTTER DEPOSITION
Y2O3 YTTRIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - Y2O3 - SPUTTER DEPOSITION
Yb2O3 YTTERBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - YB2O3 - SPUTTER DEPOSITION
YbF3 YTTERBIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - YBF3 - SPUTTER DEPOSITION
Y-Ba-Fluoride YTTERBIUM BARIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - Y-BA-FLUORIDE - SPUTTER DEPOSITION
Yb-Ca-Fluoride YTTERBIUM CALCIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - YB-CA-FLUORIDE - SPUTTER DEPOSITION
YBCO YTTRIUM BARIUM COPPER OXIDE PHYSICAL VAPOR DEPOSITION - PVD - YBCO - SPUTTER DEPOSITION
Zn ZINC PHYSICAL VAPOR DEPOSITION - PVD - ZN - SPUTTER DEPOSITION
ZnO ZINC OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNO - SPUTTER DEPOSITION
ZnO/Al2O3 ZINC OXIDE / ALUMINUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNO/AL2O3 - SPUTTER DEPOSITION
ZnS ZINC SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNS - SPUTTER DEPOSITION
ZnSe ZINC SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNSE - SPUTTER DEPOSITION
ZnTe ZINC TELURIDE PHYSICAL VAPOR DEPOSITION - PVD - ZNTE - SPUTTER DEPOSITION
Zr ZIRCONIUM PHYSICAL VAPOR DEPOSITION - PVD - ZR - SPUTTER DEPOSITION
ZrB2 ZIRCONIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRB2 - SPUTTER DEPOSITION
ZrC ZIRCONIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRC - SPUTTER DEPOSITION
ZrF4 ZIRCONIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRF4 - SPUTTER DEPOSITION
ZrO ZIRCONIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRO - SPUTTER DEPOSITION
ZrO2 ZIRCONIUM DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRO2 - SPUTTER DEPOSITION
ZrO2 -5 wt% CaO ZIRCONIUM OXIDE-CALCIA STAB. PHYSICAL VAPOR DEPOSITION - PVD - ZRO2 -5 WT% CAO - SPUTTER DEPOSITION
ZrO2-Y2O3 ZIRCONIUM OXIDE YTTRIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRO2-Y2O3 - SPUTTER DEPOSITION
ZrSi2 ZIRCONIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - ZRSI2 - SPUTTER DEPOSITION

Physical vapor deposition (PVD) is a widely used technique in semiconductor integrated circuit (IC) manufacturing.
Sputter deposition is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a "target," that is source, which then deposits onto a "substrate," such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment.
Sputtered atoms ejected from the target have a wide energy distribution, typically up to tens of eV (100,000 K). The sputtered ions (typically only about 1% of the ejected particles is ionized) can ballistically fly from the target in straight lines and impact energetically on the substrates or vacuum chamber causing resputtering. At higher gas pressures, they collide with the gas atoms that act as a moderator and move diffusively, reaching the substrates or vacuum chamber wall and condensing after undergoing a random walk. The entire range from high-energy ballistic impact to low-energy thermalized motion is accessible by changing the background gas pressure. The sputtering gas is often an inert gas such as argon. For efficient momentum transfer, the atomic weight of the sputtering gas should be close to the atomic weight of the target, so for sputtering light elements neon is preferable, while for heavy elements krypton or xenon are used. Reactive gases can also be used to sputter compounds. The compound can be formed on the target surface, in-flight or on the substrate depending on the process parameters. The availability of many parameters that control sputter deposition make it a complex process, but also allow experts a large degree of control over the growth and microstructure of the film.
Sputtering is used extensively in the semiconductor industry to deposit thin films of various materials in integrated circuit processing. Thin antireflection coatings on glass for optical applications are also deposited by sputtering. Because of the low substrate temperatures used, sputtering is an ideal method to deposit contact metals for thin-film transistors. Perhaps the most familiar products of sputtering are low-emissivity coatings on glass, used in double-pane window assemblies. The coating is a multilayer containing silver and metal oxides such as zinc oxide, tin oxide, or titanium dioxide. Sputtering is also used to metalize plastics such as potato chip bags. A large industry has developed around tool bit coating using sputtered nitrides, such as titanium nitride, creating the familiar gold colored hard coat.

Home>PVD REACTIVE SPUTTERING> Last updated: September 04, 2009

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