BACKSIDE METALLIZATION PVD - SPUTTERING DEPOSITION - PHYSICAL VAPOR DEPOSITION - SPUTTERING THIN FILMS METALS ALLOYS DIELECTRICS DC RF MAGNETRON SPUTTER DEPOSITION AND REACTIVE SPUTTERING, Al Aluminum, AlCu4% ALUMINUM COPPER 4%, AlN Aluminum nitride, Al2O3 Aluminum oxide, AlSi1% ALUMINUM SILICON 1%, AlSi1%Cu0.5% ALUMINUM SILICON 1% COPPER 0.5%, Sb Antimony, BaF2 Barium fluoride, Bi Bismuth, Bi2O3 Bismuth oxide, Bi4Ti3O12 Bismuth titanate, B Boron, B4C Boron carbide, BN Boron nitride, Cd Cadmium, CdSe Cadmium selenide, CdS Cadmium sulfide, CdTe Cadmium telluride, CaF2 Calcium fluoride, CaO Calcium oxide, CeF3 Cerium fluoride, Ce Cerium metal, CeO2 Cerium oxide, CsI Cesium iodide, Cr Chromium, CrB2 Chromium boride, Cr3C2 Chromium carbide, Cr2O3 Chromium oxide, CrSi2 Chromium silicide, Cr3Si Chromium silicide, Cr-SiO Chromium-silicon monoxide, ZnS Cirom(tm)-2 zinc sulfide, Co Cobalt, Cu Copper, CuO Copper oxide, Cu2Se Copper selenide, Ga2O3 Gallium oxide, Au Gold, C Graphite, Hf Hafnium, HfB2 Hafnium boride, HfC Hafnium carbide, HfN Hafnium nitride, HfO2-unstabilized Hafnium oxide unstabilized, HfO2-Y2O3 Hafnium oxide-yttria stabilized, HfSi2 Hafnium silicide, In Indium, In2O3 Indium oxide, In2Se3 Indium selenide, In2O3-SnO2 Indium-tin oxide, Ir Iridium metal, Fe Iron, Fe2O3 Iron oxide, Fe3O4 Iron oxide, LaAlO3 Lanthanum aluminate, LaB6 Lanthanum boride, LaF3 Lanthanum fluoride, PbF2 Lead fluoride, PbO Lead oxide, PbSe Lead selenide, PbTe Lead telluride, LiF Lithium fluoride, LiNbO3 Lithium niobate, Mg Magnesium, MgF2 Magnesium fluoride, MgO Magnesium oxide, Mn Manganese, Mo Molybdenum, MoO3 Molybdenum oxide, MoSi2 Molybdenum silicide, MoS2 Molybdenum sulfide, Ni Nickel, NiO Nickel oxide, Ni-Cr20% NICKEL-CHROMIUM 20%, Ni-Cr Nickel-chromium, NiFe17% NICKEL IRON 17%, NiFe19% NICKEL IRON 19%, NiFe55% NICKEL IRON 55%, Ni-Fe Nickel-iron, NiO NICKEL OXIDE, NiV7% NICKEL-VANADIUM 7%, Nb Niobium, NbC Niobium carbide, NbN Niobium nitride, Nb2O5 Niobium oxide, NbSi2 Niobium silicide, Pd Palladium metal, Pt Platinum metal, Re Rhenium, Rh Rhodium metal, Ru Ruthenium, Si Silicon, SiC Silicon carbide, SiO2 Silicon dioxide, SiO Silicon monoxide, Si3N4 Silicon nitride, Ag Silver metal, NaF Sodium fluoride, SrF2 Strontium fluoride, SrTiO3 Strontium titanate, SrZrO3 Strontium zirconate, Ta Tantalum, TaC Tantalum carbide, TaN Tantalum nitride, Ta2O5 Tantalum oxide, TaSe2 Tantalum selenide, TaSi2 Tantalum silicide, Ta5Si3 Tantalum silicide, Te Tellurium, Sn Tin, SnO2 Tin oxide, Ti Titanium, TiB2 Titanium boride, TiC Titanium carbide, TiN Titanium nitride, TiO2 Titanium oxide, TiSi2 Titanium silicide, Ti5Si3 Titanium silicide, TiSi2 Titanium silicide, W Tungsten, WC Tungsten carbide, WO3 Tungsten oxide, WSe2 Tungsten selenide, WSi2 Tungsten silicide, WS2 Tungsten sulfide, W-Ti Tungsten-titanium, W-Ti10% TUNGSTEN-TITANIUM 10%, W-Ti Tungsten-titanium, V Vanadium, V2O5 Vanadium oxide, VSi2 Vanadium silicide, YF3 Yttrium fluoride, Y Yttrium metal, Y2O3 Yttrium oxide, Zn Zinc, ZnO Zinc oxide, ZnO-Al2O3 Zinc oxide-aluminum oxide, ZnSe Zinc selenide, ZnS Zinc sulfide, Zr Zirconium, ZrB2 Zirconium boride, ZrC Zirconium carbide, ZrO2-unstabilized Zirconium oxide unstabilized, ZrO2-CaO Zirconium oxide-calcia stabilized, ZrO2-Y2O3 Zirconium oxide-yttria stabilized, ZrSi2 Zirconium silicide, PHYSICAL VAPOR DEPOSITION - METALS, ALLOYS, DIELECTRICS MAGNETRON SPUTTER DEPOSITION, DC , RF PVD REACTIVE SPUTTERING Al ALUMINUM PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM - SPUTTER DEPOSITION AlCu4% ALUMINUM COPPER 4% PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM COPPER 4% - SPUTTER DEPOSITION AlN ALUMINUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM NITRIDE - SPUTTER DEPOSITION Al2O3 ALUMINUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM OXIDE - SPUTTER DEPOSITION AlSi1% ALUMINUM SILICON 1% PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM SILICON 1% - SPUTTER DEPOSITION AlSi1%Cu0.5% ALUMINUM SILICON 1% COPPER 0.5% PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM SILICON 1% COPPER 0.5% - SPUTTER DEPOSITION Sb ANTIMONY PHYSICAL VAPOR DEPOSITION - PVD - ANTIMONY - SPUTTER DEPOSITION BaF2 BARIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - BARIUM FLUORIDE - SPUTTER DEPOSITION Bi BISMUTH PHYSICAL VAPOR DEPOSITION - PVD - BISMUTH - SPUTTER DEPOSITION Bi2O3 BISMUTH OXIDE PHYSICAL VAPOR DEPOSITION - PVD - BISMUTH OXIDE - SPUTTER DEPOSITION Bi4Ti3O12 BISMUTH TITANATE PHYSICAL VAPOR DEPOSITION - PVD - BISMUTH TITANATE - SPUTTER DEPOSITION B BORON PHYSICAL VAPOR DEPOSITION - PVD - BORON - SPUTTER DEPOSITION B4C BORON CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - BORON CARBIDE - SPUTTER DEPOSITION BN BORON NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - BORON NITRIDE - SPUTTER DEPOSITION Cd CADMIUM PHYSICAL VAPOR DEPOSITION - PVD - CADMIUM - SPUTTER DEPOSITION CdSe CADMIUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - CADMIUM SELENIDE - SPUTTER DEPOSITION CdS CADMIUM SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - CADMIUM SULFIDE - SPUTTER DEPOSITION CdTe CADMIUM TELLURIDE PHYSICAL VAPOR DEPOSITION - PVD - CADMIUM TELLURIDE - SPUTTER DEPOSITION CaF2 CALCIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CALCIUM FLUORIDE - SPUTTER DEPOSITION CaO CALCIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CALCIUM OXIDE - SPUTTER DEPOSITION CeF3 CERIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CERIUM FLUORIDE - SPUTTER DEPOSITION Ce CERIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - CERIUM METAL - SPUTTER DEPOSITION CeO2 CERIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CERIUM OXIDE - SPUTTER DEPOSITION CsI CESIUM IODIDE PHYSICAL VAPOR DEPOSITION - PVD - CESIUM IODIDE - SPUTTER DEPOSITION Cr CHROMIUM PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM - SPUTTER DEPOSITION CrB2 CHROMIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM BORIDE - SPUTTER DEPOSITION Cr3C2 CHROMIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM CARBIDE - SPUTTER DEPOSITION Cr2O3 CHROMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM OXIDE - SPUTTER DEPOSITION CrSi2 CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM SILICIDE - SPUTTER DEPOSITION Cr3Si CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM SILICIDE - SPUTTER DEPOSITION Cr-SiO CHROMIUM-SILICON MONOXIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM-SILICON MONOXIDE - SPUTTER DEPOSITION ZnS CIROM(TM)-2 ZINC SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - CIROM(TM)-2 ZINC SULFIDE - SPUTTER DEPOSITION Co COBALT PHYSICAL VAPOR DEPOSITION - PVD - COBALT - SPUTTER DEPOSITION Cu COPPER PHYSICAL VAPOR DEPOSITION - PVD - COPPER - SPUTTER DEPOSITION CuO COPPER OXIDE PHYSICAL VAPOR DEPOSITION - PVD - COPPER OXIDE - SPUTTER DEPOSITION Cu2Se COPPER SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - COPPER SELENIDE - SPUTTER DEPOSITION Ga2O3 GALLIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - GALLIUM OXIDE - SPUTTER DEPOSITION Au GOLD PHYSICAL VAPOR DEPOSITION - PVD - GOLD - SPUTTER DEPOSITION C GRAPHITE PHYSICAL VAPOR DEPOSITION - PVD - GRAPHITE - SPUTTER DEPOSITION Hf HAFNIUM PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM - SPUTTER DEPOSITION HfB2 HAFNIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM BORIDE - SPUTTER DEPOSITION HfC HAFNIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM CARBIDE - SPUTTER DEPOSITION HfN HAFNIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM NITRIDE - SPUTTER DEPOSITION HfO2-unstabilized HAFNIUM OXIDE UNSTABILIZED PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM OXIDE UNSTABILIZED - SPUTTER DEPOSITION HfO2-Y2O3 HAFNIUM OXIDE-YTTRIA STABILIZED PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM OXIDE-YTTRIA STABILIZED - SPUTTER DEPOSITION HfSi2 HAFNIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM SILICIDE - SPUTTER DEPOSITION In INDIUM PHYSICAL VAPOR DEPOSITION - PVD - INDIUM - SPUTTER DEPOSITION In2O3 INDIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - INDIUM OXIDE - SPUTTER DEPOSITION In2Se3 INDIUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - INDIUM SELENIDE - SPUTTER DEPOSITION In2O3-SnO2 INDIUM-TIN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - INDIUM-TIN OXIDE - SPUTTER DEPOSITION Ir IRIDIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - IRIDIUM METAL - SPUTTER DEPOSITION Fe IRON PHYSICAL VAPOR DEPOSITION - PVD - IRON - SPUTTER DEPOSITION Fe2O3 IRON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - IRON OXIDE - SPUTTER DEPOSITION Fe3O4 IRON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - IRON OXIDE - SPUTTER DEPOSITION LaAlO3 LANTHANUM ALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - LANTHANUM ALUMINATE - SPUTTER DEPOSITION LaB6 LANTHANUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - LANTHANUM BORIDE - SPUTTER DEPOSITION LaF3 LANTHANUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LANTHANUM FLUORIDE - SPUTTER DEPOSITION PbF2 LEAD FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LEAD FLUORIDE - SPUTTER DEPOSITION PbO LEAD OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LEAD OXIDE - SPUTTER DEPOSITION PbSe LEAD SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - LEAD SELENIDE - SPUTTER DEPOSITION PbTe LEAD TELLURIDE PHYSICAL VAPOR DEPOSITION - PVD - LEAD TELLURIDE - SPUTTER DEPOSITION LiF LITHIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LITHIUM FLUORIDE - SPUTTER DEPOSITION LiNbO3 LITHIUM NIOBATE PHYSICAL VAPOR DEPOSITION - PVD - LITHIUM NIOBATE - SPUTTER DEPOSITION Mg MAGNESIUM PHYSICAL VAPOR DEPOSITION - PVD - MAGNESIUM - SPUTTER DEPOSITION MgF2 MAGNESIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - MAGNESIUM FLUORIDE - SPUTTER DEPOSITION MgO MAGNESIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - MAGNESIUM OXIDE - SPUTTER DEPOSITION Mn MANGANESE PHYSICAL VAPOR DEPOSITION - PVD - MANGANESE - SPUTTER DEPOSITION Mo MOLYBDENUM PHYSICAL VAPOR DEPOSITION - PVD - MOLYBDENUM - SPUTTER DEPOSITION MoO3 MOLYBDENUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - MOLYBDENUM OXIDE - SPUTTER DEPOSITION MoSi2 MOLYBDENUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - MOLYBDENUM SILICIDE - SPUTTER DEPOSITION MoS2 MOLYBDENUM SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - MOLYBDENUM SULFIDE - SPUTTER DEPOSITION Ni NICKEL PHYSICAL VAPOR DEPOSITION - PVD - NICKEL - SPUTTER DEPOSITION NiO NICKEL OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NICKEL OXIDE - SPUTTER DEPOSITION Ni-Cr20% NICKEL-CHROMIUM 20% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL-CHROMIUM 20% - SPUTTER DEPOSITION Ni-Cr NICKEL-CHROMIUM PHYSICAL VAPOR DEPOSITION - PVD - NICKEL-CHROMIUM - SPUTTER DEPOSITION NiFe17% NICKEL IRON 17% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL IRON 17% - SPUTTER DEPOSITION NiFe19% NICKEL IRON 19% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL IRON 19% - SPUTTER DEPOSITION NiFe55% NICKEL IRON 55% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL IRON 55% - SPUTTER DEPOSITION Ni-Fe NICKEL-IRON PHYSICAL VAPOR DEPOSITION - PVD - NICKEL-IRON - SPUTTER DEPOSITION NiO NICKEL OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NICKEL OXIDE - SPUTTER DEPOSITION NiV7% NICKEL-VANADIUM 7% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL-VANADIUM 7% - SPUTTER DEPOSITION Nb NIOBIUM PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM - SPUTTER DEPOSITION NbC NIOBIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM CARBIDE - SPUTTER DEPOSITION NbN NIOBIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM NITRIDE - SPUTTER DEPOSITION Nb2O5 NIOBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM OXIDE - SPUTTER DEPOSITION NbSi2 NIOBIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM SILICIDE - SPUTTER DEPOSITION Pd PALLADIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - PALLADIUM METAL - SPUTTER DEPOSITION Pt PLATINUM METAL PHYSICAL VAPOR DEPOSITION - PVD - PLATINUM METAL - SPUTTER DEPOSITION Re RHENIUM PHYSICAL VAPOR DEPOSITION - PVD - RHENIUM - SPUTTER DEPOSITION Rh RHODIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - RHODIUM METAL - SPUTTER DEPOSITION Ru RUTHENIUM PHYSICAL VAPOR DEPOSITION - PVD - RUTHENIUM - SPUTTER DEPOSITION Si SILICON PHYSICAL VAPOR DEPOSITION - PVD - SILICON - SPUTTER DEPOSITION SiC SILICON CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - SILICON CARBIDE - SPUTTER DEPOSITION SiO2 SILICON DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SILICON DIOXIDE - SPUTTER DEPOSITION SiO SILICON MONOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SILICON MONOXIDE - SPUTTER DEPOSITION Si3N4 SILICON NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - SILICON NITRIDE - SPUTTER DEPOSITION Ag SILVER METAL PHYSICAL VAPOR DEPOSITION - PVD - SILVER METAL - SPUTTER DEPOSITION NaF SODIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - SODIUM FLUORIDE - SPUTTER DEPOSITION SrF2 STRONTIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - STRONTIUM FLUORIDE - SPUTTER DEPOSITION SrTiO3 STRONTIUM TITANATE PHYSICAL VAPOR DEPOSITION - PVD - STRONTIUM TITANATE - SPUTTER DEPOSITION SrZrO3 STRONTIUM ZIRCONATE PHYSICAL VAPOR DEPOSITION - PVD - STRONTIUM ZIRCONATE - SPUTTER DEPOSITION Ta TANTALUM PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM - SPUTTER DEPOSITION TaC TANTALUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM CARBIDE - SPUTTER DEPOSITION TaN TANTALUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM NITRIDE - SPUTTER DEPOSITION Ta2O5 TANTALUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM OXIDE - SPUTTER DEPOSITION TaSe2 TANTALUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM SELENIDE - SPUTTER DEPOSITION TaSi2 TANTALUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM SILICIDE - SPUTTER DEPOSITION Ta5Si3 TANTALUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM SILICIDE - SPUTTER DEPOSITION Te TELLURIUM PHYSICAL VAPOR DEPOSITION - PVD - TELLURIUM - SPUTTER DEPOSITION Sn TIN PHYSICAL VAPOR DEPOSITION - PVD - TIN - SPUTTER DEPOSITION SnO2 TIN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TIN OXIDE - SPUTTER DEPOSITION Ti TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM - SPUTTER DEPOSITION TiB2 TITANIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM BORIDE - SPUTTER DEPOSITION TiC TITANIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM CARBIDE - SPUTTER DEPOSITION TiN TITANIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM NITRIDE - SPUTTER DEPOSITION TiO2 TITANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM OXIDE - SPUTTER DEPOSITION TiSi2 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM SILICIDE - SPUTTER DEPOSITION Ti5Si3 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM SILICIDE - SPUTTER DEPOSITION TiSi2 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM SILICIDE - SPUTTER DEPOSITION W TUNGSTEN PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN - SPUTTER DEPOSITION WC TUNGSTEN CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN CARBIDE - SPUTTER DEPOSITION WO3 TUNGSTEN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN OXIDE - SPUTTER DEPOSITION WSe2 TUNGSTEN SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN SELENIDE - SPUTTER DEPOSITION WSi2 TUNGSTEN SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN SILICIDE - SPUTTER DEPOSITION WS2 TUNGSTEN SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN SULFIDE - SPUTTER DEPOSITION W-Ti TUNGSTEN-TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN-TITANIUM - SPUTTER DEPOSITION W-Ti10% TUNGSTEN-TITANIUM 10% PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN-TITANIUM 10% - SPUTTER DEPOSITION W-Ti TUNGSTEN-TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN-TITANIUM - SPUTTER DEPOSITION V VANADIUM PHYSICAL VAPOR DEPOSITION - PVD - VANADIUM - SPUTTER DEPOSITION V2O5 VANADIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - VANADIUM OXIDE - SPUTTER DEPOSITION VSi2 VANADIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - VANADIUM SILICIDE - SPUTTER DEPOSITION YF3 YTTRIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - YTTRIUM FLUORIDE - SPUTTER DEPOSITION Y YTTRIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - YTTRIUM METAL - SPUTTER DEPOSITION Y2O3 YTTRIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - YTTRIUM OXIDE - SPUTTER DEPOSITION Zn ZINC PHYSICAL VAPOR DEPOSITION - PVD - ZINC - SPUTTER DEPOSITION ZnO ZINC OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZINC OXIDE - SPUTTER DEPOSITION ZnO-Al2O3 ZINC OXIDE-ALUMINUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZINC OXIDE-ALUMINUM OXIDE - SPUTTER DEPOSITION ZnSe ZINC SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - ZINC SELENIDE - SPUTTER DEPOSITION ZnS ZINC SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - ZINC SULFIDE - SPUTTER DEPOSITION Zr ZIRCONIUM PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM - SPUTTER DEPOSITION ZrB2 ZIRCONIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM BORIDE - SPUTTER DEPOSITION ZrC ZIRCONIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM CARBIDE - SPUTTER DEPOSITION ZrO2-unstabilized ZIRCONIUM OXIDE UNSTABILIZED PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM OXIDE UNSTABILIZED - SPUTTER DEPOSITION ZrO2-CaO ZIRCONIUM OXIDE-CALCIA STABILIZED PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM OXIDE-CALCIA STABILIZED - SPUTTER DEPOSITION ZrO2-Y2O3 ZIRCONIUM OXIDE-YTTRIA STABILIZED PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM OXIDE-YTTRIA STABILIZED - SPUTTER DEPOSITION ZrSi2 ZIRCONIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM SILICIDE - SPUTTER DEPOSITION PVD - SPUTTERING DEPOSITION - PHYSICAL VAPOR DEPOSITION - SPUTTERING THIN FILMS METALS ALLOYS DIELECTRICS DC RF MAGNETRON SPUTTER DEPOSITION AND REACTIVE SPUTTERING, Al Aluminum, AlCu4% ALUMINUM COPPER 4%, AlN Aluminum nitride, Al2O3 Aluminum oxide, AlSi1% ALUMINUM SILICON 1%, AlSi1%Cu0.5% ALUMINUM SILICON 1% COPPER 0.5%, Sb Antimony, BaF2 Barium fluoride, Bi Bismuth, Bi2O3 Bismuth oxide, Bi4Ti3O12 Bismuth titanate, B Boron, B4C Boron carbide, BN Boron nitride, Cd Cadmium, CdSe Cadmium selenide, CdS Cadmium sulfide, CdTe Cadmium telluride, CaF2 Calcium fluoride, CaO Calcium oxide, CeF3 Cerium fluoride, Ce Cerium metal, CeO2 Cerium oxide, CsI Cesium iodide, Cr Chromium, CrB2 Chromium boride, Cr3C2 Chromium carbide, Cr2O3 Chromium oxide, CrSi2 Chromium silicide, Cr3Si Chromium silicide, Cr-SiO Chromium-silicon monoxide, ZnS Cirom(tm)-2 zinc sulfide, Co Cobalt, Cu Copper, CuO Copper oxide, Cu2Se Copper selenide, Ga2O3 Gallium oxide, Au Gold, C Graphite, Hf Hafnium, HfB2 Hafnium boride, HfC Hafnium carbide, HfN Hafnium nitride, HfO2-unstabilized Hafnium oxide unstabilized, HfO2-Y2O3 Hafnium oxide-yttria stabilized, HfSi2 Hafnium silicide, In Indium, In2O3 Indium oxide, In2Se3 Indium selenide, In2O3-SnO2 Indium-tin oxide, Ir Iridium metal, Fe Iron, Fe2O3 Iron oxide, Fe3O4 Iron oxide, LaAlO3 Lanthanum aluminate, LaB6 Lanthanum boride, LaF3 Lanthanum fluoride, PbF2 Lead fluoride, PbO Lead oxide, PbSe Lead selenide, PbTe Lead telluride, LiF Lithium fluoride, LiNbO3 Lithium niobate, Mg Magnesium, MgF2 Magnesium fluoride, MgO Magnesium oxide, Mn Manganese, Mo Molybdenum, MoO3 Molybdenum oxide, MoSi2 Molybdenum silicide, MoS2 Molybdenum sulfide, Ni Nickel, NiO Nickel oxide, Ni-Cr20% NICKEL-CHROMIUM 20%, Ni-Cr Nickel-chromium, NiFe17% NICKEL IRON 17%, NiFe19% NICKEL IRON 19%, NiFe55% NICKEL IRON 55%, Ni-Fe Nickel-iron, NiO NICKEL OXIDE, NiV7% NICKEL-VANADIUM 7%, Nb Niobium, NbC Niobium carbide, NbN Niobium nitride, Nb2O5 Niobium oxide, NbSi2 Niobium silicide, Pd Palladium metal, Pt Platinum metal, Re Rhenium, Rh Rhodium metal, Ru Ruthenium, Si Silicon, SiC Silicon carbide, SiO2 Silicon dioxide, SiO Silicon monoxide, Si3N4 Silicon nitride, Ag Silver metal, NaF Sodium fluoride, SrF2 Strontium fluoride, SrTiO3 Strontium titanate, SrZrO3 Strontium zirconate, Ta Tantalum, TaC Tantalum carbide, TaN Tantalum nitride, Ta2O5 Tantalum oxide, TaSe2 Tantalum selenide, TaSi2 Tantalum silicide, Ta5Si3 Tantalum silicide, Te Tellurium, Sn Tin, SnO2 Tin oxide, Ti Titanium, TiB2 Titanium boride, TiC Titanium carbide, TiN Titanium nitride, TiO2 Titanium oxide, TiSi2 Titanium silicide, Ti5Si3 Titanium silicide, TiSi2 Titanium silicide, W Tungsten, WC Tungsten carbide, WO3 Tungsten oxide, WSe2 Tungsten selenide, WSi2 Tungsten silicide, WS2 Tungsten sulfide, W-Ti Tungsten-titanium, W-Ti10% TUNGSTEN-TITANIUM 10%, W-Ti Tungsten-titanium, V Vanadium, V2O5 Vanadium oxide, VSi2 Vanadium silicide, YF3 Yttrium fluoride, Y Yttrium metal, Y2O3 Yttrium oxide, Zn Zinc, ZnO Zinc oxide, ZnO-Al2O3 Zinc oxide-aluminum oxide, ZnSe Zinc selenide, ZnS Zinc sulfide, Zr Zirconium, ZrB2 Zirconium boride, ZrC Zirconium carbide, ZrO2-unstabilized Zirconium oxide unstabilized, ZrO2-CaO Zirconium oxide-calcia stabilized, ZrO2-Y2O3 Zirconium oxide-yttria stabilized, ZrSi2 Zirconium silicide, PHYSICAL VAPOR DEPOSITION - METALS, ALLOYS, DIELECTRICS MAGNETRON SPUTTER DEPOSITION, DC , RF PVD REACTIVE SPUTTERING Al ALUMINUM PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM - SPUTTER DEPOSITION AlCu4% ALUMINUM COPPER 4% PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM COPPER 4% - SPUTTER DEPOSITION AlN ALUMINUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM NITRIDE - SPUTTER DEPOSITION Al2O3 ALUMINUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM OXIDE - SPUTTER DEPOSITION AlSi1% ALUMINUM SILICON 1% PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM SILICON 1% - SPUTTER DEPOSITION AlSi1%Cu0.5% ALUMINUM SILICON 1% COPPER 0.5% PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM SILICON 1% COPPER 0.5% - SPUTTER DEPOSITION Sb ANTIMONY PHYSICAL VAPOR DEPOSITION - PVD - ANTIMONY - SPUTTER DEPOSITION BaF2 BARIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - BARIUM FLUORIDE - SPUTTER DEPOSITION Bi BISMUTH PHYSICAL VAPOR DEPOSITION - PVD - BISMUTH - SPUTTER DEPOSITION Bi2O3 BISMUTH OXIDE PHYSICAL VAPOR DEPOSITION - PVD - BISMUTH OXIDE - SPUTTER DEPOSITION Bi4Ti3O12 BISMUTH TITANATE PHYSICAL VAPOR DEPOSITION - PVD - BISMUTH TITANATE - SPUTTER DEPOSITION B BORON PHYSICAL VAPOR DEPOSITION - PVD - BORON - SPUTTER DEPOSITION B4C BORON CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - BORON CARBIDE - SPUTTER DEPOSITION BN BORON NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - BORON NITRIDE - SPUTTER DEPOSITION Cd CADMIUM PHYSICAL VAPOR DEPOSITION - PVD - CADMIUM - SPUTTER DEPOSITION CdSe CADMIUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - CADMIUM SELENIDE - SPUTTER DEPOSITION CdS CADMIUM SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - CADMIUM SULFIDE - SPUTTER DEPOSITION CdTe CADMIUM TELLURIDE PHYSICAL VAPOR DEPOSITION - PVD - CADMIUM TELLURIDE - SPUTTER DEPOSITION CaF2 CALCIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CALCIUM FLUORIDE - SPUTTER DEPOSITION CaO CALCIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CALCIUM OXIDE - SPUTTER DEPOSITION CeF3 CERIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CERIUM FLUORIDE - SPUTTER DEPOSITION Ce CERIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - CERIUM METAL - SPUTTER DEPOSITION CeO2 CERIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CERIUM OXIDE - SPUTTER DEPOSITION CsI CESIUM IODIDE PHYSICAL VAPOR DEPOSITION - PVD - CESIUM IODIDE - SPUTTER DEPOSITION Cr CHROMIUM PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM - SPUTTER DEPOSITION CrB2 CHROMIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM BORIDE - SPUTTER DEPOSITION Cr3C2 CHROMIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM CARBIDE - SPUTTER DEPOSITION Cr2O3 CHROMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM OXIDE - SPUTTER DEPOSITION CrSi2 CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM SILICIDE - SPUTTER DEPOSITION Cr3Si CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM SILICIDE - SPUTTER DEPOSITION Cr-SiO CHROMIUM-SILICON MONOXIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM-SILICON MONOXIDE - SPUTTER DEPOSITION ZnS CIROM(TM)-2 ZINC SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - CIROM(TM)-2 ZINC SULFIDE - SPUTTER DEPOSITION Co COBALT PHYSICAL VAPOR DEPOSITION - PVD - COBALT - SPUTTER DEPOSITION Cu COPPER PHYSICAL VAPOR DEPOSITION - PVD - COPPER - SPUTTER DEPOSITION CuO COPPER OXIDE PHYSICAL VAPOR DEPOSITION - PVD - COPPER OXIDE - SPUTTER DEPOSITION Cu2Se COPPER SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - COPPER SELENIDE - SPUTTER DEPOSITION Ga2O3 GALLIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - GALLIUM OXIDE - SPUTTER DEPOSITION Au GOLD PHYSICAL VAPOR DEPOSITION - PVD - GOLD - SPUTTER DEPOSITION C GRAPHITE PHYSICAL VAPOR DEPOSITION - PVD - GRAPHITE - SPUTTER DEPOSITION Hf HAFNIUM PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM - SPUTTER DEPOSITION HfB2 HAFNIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM BORIDE - SPUTTER DEPOSITION HfC HAFNIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM CARBIDE - SPUTTER DEPOSITION HfN HAFNIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM NITRIDE - SPUTTER DEPOSITION HfO2-unstabilized HAFNIUM OXIDE UNSTABILIZED PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM OXIDE UNSTABILIZED - SPUTTER DEPOSITION HfO2-Y2O3 HAFNIUM OXIDE-YTTRIA STABILIZED PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM OXIDE-YTTRIA STABILIZED - SPUTTER DEPOSITION HfSi2 HAFNIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM SILICIDE - SPUTTER DEPOSITION In INDIUM PHYSICAL VAPOR DEPOSITION - PVD - INDIUM - SPUTTER DEPOSITION In2O3 INDIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - INDIUM OXIDE - SPUTTER DEPOSITION In2Se3 INDIUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - INDIUM SELENIDE - SPUTTER DEPOSITION In2O3-SnO2 INDIUM-TIN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - INDIUM-TIN OXIDE - SPUTTER DEPOSITION Ir IRIDIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - IRIDIUM METAL - SPUTTER DEPOSITION Fe IRON PHYSICAL VAPOR DEPOSITION - PVD - IRON - SPUTTER DEPOSITION Fe2O3 IRON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - IRON OXIDE - SPUTTER DEPOSITION Fe3O4 IRON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - IRON OXIDE - SPUTTER DEPOSITION LaAlO3 LANTHANUM ALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - LANTHANUM ALUMINATE - SPUTTER DEPOSITION LaB6 LANTHANUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - LANTHANUM BORIDE - SPUTTER DEPOSITION LaF3 LANTHANUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LANTHANUM FLUORIDE - SPUTTER DEPOSITION PbF2 LEAD FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LEAD FLUORIDE - SPUTTER DEPOSITION PbO LEAD OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LEAD OXIDE - SPUTTER DEPOSITION PbSe LEAD SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - LEAD SELENIDE - SPUTTER DEPOSITION PbTe LEAD TELLURIDE PHYSICAL VAPOR DEPOSITION - PVD - LEAD TELLURIDE - SPUTTER DEPOSITION LiF LITHIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LITHIUM FLUORIDE - SPUTTER DEPOSITION LiNbO3 LITHIUM NIOBATE PHYSICAL VAPOR DEPOSITION - PVD - LITHIUM NIOBATE - SPUTTER DEPOSITION Mg MAGNESIUM PHYSICAL VAPOR DEPOSITION - PVD - MAGNESIUM - SPUTTER DEPOSITION MgF2 MAGNESIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - MAGNESIUM FLUORIDE - SPUTTER DEPOSITION MgO MAGNESIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - MAGNESIUM OXIDE - SPUTTER DEPOSITION Mn MANGANESE PHYSICAL VAPOR DEPOSITION - PVD - MANGANESE - SPUTTER DEPOSITION Mo MOLYBDENUM PHYSICAL VAPOR DEPOSITION - PVD - MOLYBDENUM - SPUTTER DEPOSITION MoO3 MOLYBDENUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - MOLYBDENUM OXIDE - SPUTTER DEPOSITION MoSi2 MOLYBDENUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - MOLYBDENUM SILICIDE - SPUTTER DEPOSITION MoS2 MOLYBDENUM SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - MOLYBDENUM SULFIDE - SPUTTER DEPOSITION Ni NICKEL PHYSICAL VAPOR DEPOSITION - PVD - NICKEL - SPUTTER DEPOSITION NiO NICKEL OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NICKEL OXIDE - SPUTTER DEPOSITION Ni-Cr20% NICKEL-CHROMIUM 20% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL-CHROMIUM 20% - SPUTTER DEPOSITION Ni-Cr NICKEL-CHROMIUM PHYSICAL VAPOR DEPOSITION - PVD - NICKEL-CHROMIUM - SPUTTER DEPOSITION NiFe17% NICKEL IRON 17% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL IRON 17% - SPUTTER DEPOSITION NiFe19% NICKEL IRON 19% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL IRON 19% - SPUTTER DEPOSITION NiFe55% NICKEL IRON 55% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL IRON 55% - SPUTTER DEPOSITION Ni-Fe NICKEL-IRON PHYSICAL VAPOR DEPOSITION - PVD - NICKEL-IRON - SPUTTER DEPOSITION NiO NICKEL OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NICKEL OXIDE - SPUTTER DEPOSITION NiV7% NICKEL-VANADIUM 7% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL-VANADIUM 7% - SPUTTER DEPOSITION Nb NIOBIUM PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM - SPUTTER DEPOSITION NbC NIOBIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM CARBIDE - SPUTTER DEPOSITION NbN NIOBIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM NITRIDE - SPUTTER DEPOSITION Nb2O5 NIOBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM OXIDE - SPUTTER DEPOSITION NbSi2 NIOBIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM SILICIDE - SPUTTER DEPOSITION Pd PALLADIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - PALLADIUM METAL - SPUTTER DEPOSITION Pt PLATINUM METAL PHYSICAL VAPOR DEPOSITION - PVD - PLATINUM METAL - SPUTTER DEPOSITION Re RHENIUM PHYSICAL VAPOR DEPOSITION - PVD - RHENIUM - SPUTTER DEPOSITION Rh RHODIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - RHODIUM METAL - SPUTTER DEPOSITION Ru RUTHENIUM PHYSICAL VAPOR DEPOSITION - PVD - RUTHENIUM - SPUTTER DEPOSITION Si SILICON PHYSICAL VAPOR DEPOSITION - PVD - SILICON - SPUTTER DEPOSITION SiC SILICON CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - SILICON CARBIDE - SPUTTER DEPOSITION SiO2 SILICON DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SILICON DIOXIDE - SPUTTER DEPOSITION SiO SILICON MONOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SILICON MONOXIDE - SPUTTER DEPOSITION Si3N4 SILICON NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - SILICON NITRIDE - SPUTTER DEPOSITION Ag SILVER METAL PHYSICAL VAPOR DEPOSITION - PVD - SILVER METAL - SPUTTER DEPOSITION NaF SODIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - SODIUM FLUORIDE - SPUTTER DEPOSITION SrF2 STRONTIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - STRONTIUM FLUORIDE - SPUTTER DEPOSITION SrTiO3 STRONTIUM TITANATE PHYSICAL VAPOR DEPOSITION - PVD - STRONTIUM TITANATE - SPUTTER DEPOSITION SrZrO3 STRONTIUM ZIRCONATE PHYSICAL VAPOR DEPOSITION - PVD - STRONTIUM ZIRCONATE - SPUTTER DEPOSITION Ta TANTALUM PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM - SPUTTER DEPOSITION TaC TANTALUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM CARBIDE - SPUTTER DEPOSITION TaN TANTALUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM NITRIDE - SPUTTER DEPOSITION Ta2O5 TANTALUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM OXIDE - SPUTTER DEPOSITION TaSe2 TANTALUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM SELENIDE - SPUTTER DEPOSITION TaSi2 TANTALUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM SILICIDE - SPUTTER DEPOSITION Ta5Si3 TANTALUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM SILICIDE - SPUTTER DEPOSITION Te TELLURIUM PHYSICAL VAPOR DEPOSITION - PVD - TELLURIUM - SPUTTER DEPOSITION Sn TIN PHYSICAL VAPOR DEPOSITION - PVD - TIN - SPUTTER DEPOSITION SnO2 TIN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TIN OXIDE - SPUTTER DEPOSITION Ti TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM - SPUTTER DEPOSITION TiB2 TITANIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM BORIDE - SPUTTER DEPOSITION TiC TITANIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM CARBIDE - SPUTTER DEPOSITION TiN TITANIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM NITRIDE - SPUTTER DEPOSITION TiO2 TITANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM OXIDE - SPUTTER DEPOSITION TiSi2 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM SILICIDE - SPUTTER DEPOSITION Ti5Si3 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM SILICIDE - SPUTTER DEPOSITION TiSi2 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM SILICIDE - SPUTTER DEPOSITION W TUNGSTEN PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN - SPUTTER DEPOSITION WC TUNGSTEN CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN CARBIDE - SPUTTER DEPOSITION WO3 TUNGSTEN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN OXIDE - SPUTTER DEPOSITION WSe2 TUNGSTEN SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN SELENIDE - SPUTTER DEPOSITION WSi2 TUNGSTEN SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN SILICIDE - SPUTTER DEPOSITION WS2 TUNGSTEN SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN SULFIDE - SPUTTER DEPOSITION W-Ti TUNGSTEN-TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN-TITANIUM - SPUTTER DEPOSITION W-Ti10% TUNGSTEN-TITANIUM 10% PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN-TITANIUM 10% - SPUTTER DEPOSITION W-Ti TUNGSTEN-TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN-TITANIUM - SPUTTER DEPOSITION V VANADIUM PHYSICAL VAPOR DEPOSITION - PVD - VANADIUM - SPUTTER DEPOSITION V2O5 VANADIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - VANADIUM OXIDE - SPUTTER DEPOSITION VSi2 VANADIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - VANADIUM SILICIDE - SPUTTER DEPOSITION YF3 YTTRIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - YTTRIUM FLUORIDE - SPUTTER DEPOSITION Y YTTRIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - YTTRIUM METAL - SPUTTER DEPOSITION Y2O3 YTTRIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - YTTRIUM OXIDE - SPUTTER DEPOSITION Zn ZINC PHYSICAL VAPOR DEPOSITION - PVD - ZINC - SPUTTER DEPOSITION ZnO ZINC OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZINC OXIDE - SPUTTER DEPOSITION ZnO-Al2O3 ZINC OXIDE-ALUMINUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZINC OXIDE-ALUMINUM OXIDE - SPUTTER DEPOSITION ZnSe ZINC SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - ZINC SELENIDE - SPUTTER DEPOSITION ZnS ZINC SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - ZINC SULFIDE - SPUTTER DEPOSITION Zr ZIRCONIUM PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM - SPUTTER DEPOSITION ZrB2 ZIRCONIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM BORIDE - SPUTTER DEPOSITION ZrC ZIRCONIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM CARBIDE - SPUTTER DEPOSITION ZrO2-unstabilized ZIRCONIUM OXIDE UNSTABILIZED PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM OXIDE UNSTABILIZED - SPUTTER DEPOSITION ZrO2-CaO ZIRCONIUM OXIDE-CALCIA STABILIZED PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM OXIDE-CALCIA STABILIZED - SPUTTER DEPOSITION ZrO2-Y2O3 ZIRCONIUM OXIDE-YTTRIA STABILIZED PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM OXIDE-YTTRIA STABILIZED - SPUTTER DEPOSITION ZrSi2 ZIRCONIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM SILICIDE - SPUTTER DEPOSITION HTE Labs logo PHYSICAL VAPOR DEPOSITION - METALS, ALLOYS, DIELECTRICS MAGNETRON SPUTTER DEPOSITION, DC , RF PVD REACTIVE SPUTTERING HTE Labs Al ALUMINUM PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM - SPUTTER DEPOSITION AlCu4% ALUMINUM COPPER 4% PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM COPPER 4% - SPUTTER DEPOSITION AlN ALUMINUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM NITRIDE - SPUTTER DEPOSITION Al2O3 ALUMINUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM OXIDE - SPUTTER DEPOSITION AlSi1% ALUMINUM SILICON 1% PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM SILICON 1% - SPUTTER DEPOSITION AlSi1%Cu0.5% ALUMINUM SILICON 1% COPPER 0.5% PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM SILICON 1% COPPER 0.5% - SPUTTER DEPOSITION Sb ANTIMONY PHYSICAL VAPOR DEPOSITION - PVD - ANTIMONY - SPUTTER DEPOSITION BaF2 BARIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - BARIUM FLUORIDE - SPUTTER DEPOSITION Bi BISMUTH PHYSICAL VAPOR DEPOSITION - PVD - BISMUTH - SPUTTER DEPOSITION Bi2O3 BISMUTH OXIDE PHYSICAL VAPOR DEPOSITION - PVD - BISMUTH OXIDE - SPUTTER DEPOSITION Bi4Ti3O12 BISMUTH TITANATE PHYSICAL VAPOR DEPOSITION - PVD - BISMUTH TITANATE - SPUTTER DEPOSITION B BORON PHYSICAL VAPOR DEPOSITION - PVD - BORON - SPUTTER DEPOSITION B4C BORON CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - BORON CARBIDE - SPUTTER DEPOSITION BN BORON NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - BORON NITRIDE - SPUTTER DEPOSITION Cd CADMIUM PHYSICAL VAPOR DEPOSITION - PVD - CADMIUM - SPUTTER DEPOSITION CdSe CADMIUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - CADMIUM SELENIDE - SPUTTER DEPOSITION CdS CADMIUM SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - CADMIUM SULFIDE - SPUTTER DEPOSITION CdTe CADMIUM TELLURIDE PHYSICAL VAPOR DEPOSITION - PVD - CADMIUM TELLURIDE - SPUTTER DEPOSITION CaF2 CALCIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CALCIUM FLUORIDE - SPUTTER DEPOSITION CaO CALCIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CALCIUM OXIDE - SPUTTER DEPOSITION CeF3 CERIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CERIUM FLUORIDE - SPUTTER DEPOSITION Ce CERIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - CERIUM METAL - SPUTTER DEPOSITION CeO2 CERIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CERIUM OXIDE - SPUTTER DEPOSITION CsI CESIUM IODIDE PHYSICAL VAPOR DEPOSITION - PVD - CESIUM IODIDE - SPUTTER DEPOSITION Cr CHROMIUM PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM - SPUTTER DEPOSITION CrB2 CHROMIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM BORIDE - SPUTTER DEPOSITION Cr3C2 CHROMIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM CARBIDE - SPUTTER DEPOSITION Cr2O3 CHROMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM OXIDE - SPUTTER DEPOSITION CrSi2 CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM SILICIDE - SPUTTER DEPOSITION Cr3Si CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM SILICIDE - SPUTTER DEPOSITION Cr-SiO CHROMIUM-SILICON MONOXIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM-SILICON MONOXIDE - SPUTTER DEPOSITION ZnS CIROM(TM)-2 ZINC SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - CIROM(TM)-2 ZINC SULFIDE - SPUTTER DEPOSITION Co COBALT PHYSICAL VAPOR DEPOSITION - PVD - COBALT - SPUTTER DEPOSITION Cu COPPER PHYSICAL VAPOR DEPOSITION - PVD - COPPER - SPUTTER DEPOSITION CuO COPPER OXIDE PHYSICAL VAPOR DEPOSITION - PVD - COPPER OXIDE - SPUTTER DEPOSITION Cu2Se COPPER SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - COPPER SELENIDE - SPUTTER DEPOSITION Ga2O3 GALLIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - GALLIUM OXIDE - SPUTTER DEPOSITION Au GOLD PHYSICAL VAPOR DEPOSITION - PVD - GOLD - SPUTTER DEPOSITION C GRAPHITE PHYSICAL VAPOR DEPOSITION - PVD - GRAPHITE - SPUTTER DEPOSITION Hf HAFNIUM PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM - SPUTTER DEPOSITION HfB2 HAFNIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM BORIDE - SPUTTER DEPOSITION HfC HAFNIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM CARBIDE - SPUTTER DEPOSITION HfN HAFNIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM NITRIDE - SPUTTER DEPOSITION HfO2-unstabilized HAFNIUM OXIDE UNSTABILIZED PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM OXIDE UNSTABILIZED - SPUTTER DEPOSITION HfO2-Y2O3 HAFNIUM OXIDE-YTTRIA STABILIZED PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM OXIDE-YTTRIA STABILIZED - SPUTTER DEPOSITION HfSi2 HAFNIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM SILICIDE - SPUTTER DEPOSITION In INDIUM PHYSICAL VAPOR DEPOSITION - PVD - INDIUM - SPUTTER DEPOSITION In2O3 INDIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - INDIUM OXIDE - SPUTTER DEPOSITION In2Se3 INDIUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - INDIUM SELENIDE - SPUTTER DEPOSITION In2O3-SnO2 INDIUM-TIN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - INDIUM-TIN OXIDE - SPUTTER DEPOSITION Ir IRIDIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - IRIDIUM METAL - SPUTTER DEPOSITION Fe IRON PHYSICAL VAPOR DEPOSITION - PVD - IRON - SPUTTER DEPOSITION Fe2O3 IRON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - IRON OXIDE - SPUTTER DEPOSITION Fe3O4 IRON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - IRON OXIDE - SPUTTER DEPOSITION LaAlO3 LANTHANUM ALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - LANTHANUM ALUMINATE - SPUTTER DEPOSITION LaB6 LANTHANUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - LANTHANUM BORIDE - SPUTTER DEPOSITION LaF3 LANTHANUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LANTHANUM FLUORIDE - SPUTTER DEPOSITION PbF2 LEAD FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LEAD FLUORIDE - SPUTTER DEPOSITION PbO LEAD OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LEAD OXIDE - SPUTTER DEPOSITION PbSe LEAD SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - LEAD SELENIDE - SPUTTER DEPOSITION PbTe LEAD TELLURIDE PHYSICAL VAPOR DEPOSITION - PVD - LEAD TELLURIDE - SPUTTER DEPOSITION LiF LITHIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LITHIUM FLUORIDE - SPUTTER DEPOSITION LiNbO3 LITHIUM NIOBATE PHYSICAL VAPOR DEPOSITION - PVD - LITHIUM NIOBATE - SPUTTER DEPOSITION Mg MAGNESIUM PHYSICAL VAPOR DEPOSITION - PVD - MAGNESIUM - SPUTTER DEPOSITION MgF2 MAGNESIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - MAGNESIUM FLUORIDE - SPUTTER DEPOSITION MgO MAGNESIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - MAGNESIUM OXIDE - SPUTTER DEPOSITION Mn MANGANESE PHYSICAL VAPOR DEPOSITION - PVD - MANGANESE - SPUTTER DEPOSITION Mo MOLYBDENUM PHYSICAL VAPOR DEPOSITION - PVD - MOLYBDENUM - SPUTTER DEPOSITION MoO3 MOLYBDENUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - MOLYBDENUM OXIDE - SPUTTER DEPOSITION MoSi2 MOLYBDENUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - MOLYBDENUM SILICIDE - SPUTTER DEPOSITION MoS2 MOLYBDENUM SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - MOLYBDENUM SULFIDE - SPUTTER DEPOSITION Ni NICKEL PHYSICAL VAPOR DEPOSITION - PVD - NICKEL - SPUTTER DEPOSITION NiO NICKEL OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NICKEL OXIDE - SPUTTER DEPOSITION Ni-Cr20% NICKEL-CHROMIUM 20% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL-CHROMIUM 20% - SPUTTER DEPOSITION Ni-Cr NICKEL-CHROMIUM PHYSICAL VAPOR DEPOSITION - PVD - NICKEL-CHROMIUM - SPUTTER DEPOSITION NiFe17% NICKEL IRON 17% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL IRON 17% - SPUTTER DEPOSITION NiFe19% NICKEL IRON 19% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL IRON 19% - SPUTTER DEPOSITION NiFe55% NICKEL IRON 55% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL IRON 55% - SPUTTER DEPOSITION Ni-Fe NICKEL-IRON PHYSICAL VAPOR DEPOSITION - PVD - NICKEL-IRON - SPUTTER DEPOSITION NiO NICKEL OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NICKEL OXIDE - SPUTTER DEPOSITION NiV7% NICKEL-VANADIUM 7% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL-VANADIUM 7% - SPUTTER DEPOSITION Nb NIOBIUM PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM - SPUTTER DEPOSITION NbC NIOBIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM CARBIDE - SPUTTER DEPOSITION NbN NIOBIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM NITRIDE - SPUTTER DEPOSITION Nb2O5 NIOBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM OXIDE - SPUTTER DEPOSITION NbSi2 NIOBIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM SILICIDE - SPUTTER DEPOSITION Pd PALLADIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - PALLADIUM METAL - SPUTTER DEPOSITION Pt PLATINUM METAL PHYSICAL VAPOR DEPOSITION - PVD - PLATINUM METAL - SPUTTER DEPOSITION Re RHENIUM PHYSICAL VAPOR DEPOSITION - PVD - RHENIUM - SPUTTER DEPOSITION Rh RHODIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - RHODIUM METAL - SPUTTER DEPOSITION Ru RUTHENIUM PHYSICAL VAPOR DEPOSITION - PVD - RUTHENIUM - SPUTTER DEPOSITION Si SILICON PHYSICAL VAPOR DEPOSITION - PVD - SILICON - SPUTTER DEPOSITION SiC SILICON CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - SILICON CARBIDE - SPUTTER DEPOSITION SiO2 SILICON DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SILICON DIOXIDE - SPUTTER DEPOSITION SiO SILICON MONOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SILICON MONOXIDE - SPUTTER DEPOSITION Si3N4 SILICON NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - SILICON NITRIDE - SPUTTER DEPOSITION Ag SILVER METAL PHYSICAL VAPOR DEPOSITION - PVD - SILVER METAL - SPUTTER DEPOSITION NaF SODIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - SODIUM FLUORIDE - SPUTTER DEPOSITION SrF2 STRONTIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - STRONTIUM FLUORIDE - SPUTTER DEPOSITION SrTiO3 STRONTIUM TITANATE PHYSICAL VAPOR DEPOSITION - PVD - STRONTIUM TITANATE - SPUTTER DEPOSITION SrZrO3 STRONTIUM ZIRCONATE PHYSICAL VAPOR DEPOSITION - PVD - STRONTIUM ZIRCONATE - SPUTTER DEPOSITION Ta TANTALUM PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM - SPUTTER DEPOSITION TaC TANTALUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM CARBIDE - SPUTTER DEPOSITION TaN TANTALUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM NITRIDE - SPUTTER DEPOSITION Ta2O5 TANTALUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM OXIDE - SPUTTER DEPOSITION TaSe2 TANTALUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM SELENIDE - SPUTTER DEPOSITION TaSi2 TANTALUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM SILICIDE - SPUTTER DEPOSITION Ta5Si3 TANTALUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM SILICIDE - SPUTTER DEPOSITION Te TELLURIUM PHYSICAL VAPOR DEPOSITION - PVD - TELLURIUM - SPUTTER DEPOSITION Sn TIN PHYSICAL VAPOR DEPOSITION - PVD - TIN - SPUTTER DEPOSITION SnO2 TIN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TIN OXIDE - SPUTTER DEPOSITION Ti TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM - SPUTTER DEPOSITION TiB2 TITANIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM BORIDE - SPUTTER DEPOSITION TiC TITANIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM CARBIDE - SPUTTER DEPOSITION TiN TITANIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM NITRIDE - SPUTTER DEPOSITION TiO2 TITANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM OXIDE - SPUTTER DEPOSITION TiSi2 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM SILICIDE - SPUTTER DEPOSITION Ti5Si3 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM SILICIDE - SPUTTER DEPOSITION TiSi2 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM SILICIDE - SPUTTER DEPOSITION W TUNGSTEN PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN - SPUTTER DEPOSITION WC TUNGSTEN CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN CARBIDE - SPUTTER DEPOSITION WO3 TUNGSTEN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN OXIDE - SPUTTER DEPOSITION WSe2 TUNGSTEN SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN SELENIDE - SPUTTER DEPOSITION WSi2 TUNGSTEN SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN SILICIDE - SPUTTER DEPOSITION WS2 TUNGSTEN SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN SULFIDE - SPUTTER DEPOSITION W-Ti TUNGSTEN-TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN-TITANIUM - SPUTTER DEPOSITION W-Ti10% TUNGSTEN-TITANIUM 10% PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN-TITANIUM 10% - SPUTTER DEPOSITION W-Ti TUNGSTEN-TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN-TITANIUM - SPUTTER DEPOSITION V VANADIUM PHYSICAL VAPOR DEPOSITION - PVD - VANADIUM - SPUTTER DEPOSITION V2O5 VANADIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - VANADIUM OXIDE - SPUTTER DEPOSITION VSi2 VANADIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - VANADIUM SILICIDE - SPUTTER DEPOSITION YF3 YTTRIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - YTTRIUM FLUORIDE - SPUTTER DEPOSITION Y YTTRIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - YTTRIUM METAL - SPUTTER DEPOSITION Y2O3 YTTRIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - YTTRIUM OXIDE - SPUTTER DEPOSITION Zn ZINC PHYSICAL VAPOR DEPOSITION - PVD - ZINC - SPUTTER DEPOSITION ZnO ZINC OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZINC OXIDE - SPUTTER DEPOSITION ZnO-Al2O3 ZINC OXIDE-ALUMINUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZINC OXIDE-ALUMINUM OXIDE - SPUTTER DEPOSITION ZnSe ZINC SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - ZINC SELENIDE - SPUTTER DEPOSITION ZnS ZINC SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - ZINC SULFIDE - SPUTTER DEPOSITION Zr ZIRCONIUM PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM - SPUTTER DEPOSITION ZrB2 ZIRCONIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM BORIDE - SPUTTER DEPOSITION ZrC ZIRCONIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM CARBIDE - SPUTTER DEPOSITION ZrO2-unstabilized ZIRCONIUM OXIDE UNSTABILIZED PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM OXIDE UNSTABILIZED - SPUTTER DEPOSITION ZrO2-CaO ZIRCONIUM OXIDE-CALCIA STABILIZED PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM OXIDE-CALCIA STABILIZED - SPUTTER DEPOSITION ZrO2-Y2O3 ZIRCONIUM OXIDE-YTTRIA STABILIZED PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM OXIDE-YTTRIA STABILIZED - SPUTTER DEPOSITION ZrSi2 ZIRCONIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM SILICIDE - SPUTTER DEPOSITION Home>PVD REACTIVE SPUTTERING> Last updated:
 
 
BACKSIDE METALLIZATION
PHYSICAL VAPOR DEPOSITION - METALS, ALLOYS, DIELECTRICS
MAGNETRON SPUTTER DEPOSITION, DC , RF
PVD REACTIVE SPUTTERING
 
 

Al ALUMINUM PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM - SPUTTER DEPOSITION
AlCu4% ALUMINUM COPPER 4% PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM COPPER 4% - SPUTTER DEPOSITION
AlN ALUMINUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM NITRIDE - SPUTTER DEPOSITION
Al2O3 ALUMINUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM OXIDE - SPUTTER DEPOSITION
AlSi1% ALUMINUM SILICON 1% PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM SILICON 1% - SPUTTER DEPOSITION
AlSi1%Cu0.5% ALUMINUM SILICON 1% COPPER 0.5% PHYSICAL VAPOR DEPOSITION - PVD - ALUMINUM SILICON 1% COPPER 0.5% - SPUTTER DEPOSITION
Sb ANTIMONY PHYSICAL VAPOR DEPOSITION - PVD - ANTIMONY - SPUTTER DEPOSITION
BaF2 BARIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - BARIUM FLUORIDE - SPUTTER DEPOSITION
Bi BISMUTH PHYSICAL VAPOR DEPOSITION - PVD - BISMUTH - SPUTTER DEPOSITION
Bi2O3 BISMUTH OXIDE PHYSICAL VAPOR DEPOSITION - PVD - BISMUTH OXIDE - SPUTTER DEPOSITION
Bi4Ti3O12 BISMUTH TITANATE PHYSICAL VAPOR DEPOSITION - PVD - BISMUTH TITANATE - SPUTTER DEPOSITION
B BORON PHYSICAL VAPOR DEPOSITION - PVD - BORON - SPUTTER DEPOSITION
B4C BORON CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - BORON CARBIDE - SPUTTER DEPOSITION
BN BORON NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - BORON NITRIDE - SPUTTER DEPOSITION
Cd CADMIUM PHYSICAL VAPOR DEPOSITION - PVD - CADMIUM - SPUTTER DEPOSITION
CdSe CADMIUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - CADMIUM SELENIDE - SPUTTER DEPOSITION
CdS CADMIUM SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - CADMIUM SULFIDE - SPUTTER DEPOSITION
CdTe CADMIUM TELLURIDE PHYSICAL VAPOR DEPOSITION - PVD - CADMIUM TELLURIDE - SPUTTER DEPOSITION
CaF2 CALCIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CALCIUM FLUORIDE - SPUTTER DEPOSITION
CaO CALCIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CALCIUM OXIDE - SPUTTER DEPOSITION
CeF3 CERIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - CERIUM FLUORIDE - SPUTTER DEPOSITION
Ce CERIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - CERIUM METAL - SPUTTER DEPOSITION
CeO2 CERIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CERIUM OXIDE - SPUTTER DEPOSITION
CsI CESIUM IODIDE PHYSICAL VAPOR DEPOSITION - PVD - CESIUM IODIDE - SPUTTER DEPOSITION
Cr CHROMIUM PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM - SPUTTER DEPOSITION
CrB2 CHROMIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM BORIDE - SPUTTER DEPOSITION
Cr3C2 CHROMIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM CARBIDE - SPUTTER DEPOSITION
Cr2O3 CHROMIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM OXIDE - SPUTTER DEPOSITION
CrSi2 CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM SILICIDE - SPUTTER DEPOSITION
Cr3Si CHROMIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM SILICIDE - SPUTTER DEPOSITION
Cr-SiO CHROMIUM-SILICON MONOXIDE PHYSICAL VAPOR DEPOSITION - PVD - CHROMIUM-SILICON MONOXIDE - SPUTTER DEPOSITION
ZnS CIROM(TM)-2 ZINC SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - CIROM(TM)-2 ZINC SULFIDE - SPUTTER DEPOSITION
Co COBALT PHYSICAL VAPOR DEPOSITION - PVD - COBALT - SPUTTER DEPOSITION
Cu COPPER PHYSICAL VAPOR DEPOSITION - PVD - COPPER - SPUTTER DEPOSITION
CuO COPPER OXIDE PHYSICAL VAPOR DEPOSITION - PVD - COPPER OXIDE - SPUTTER DEPOSITION
Cu2Se COPPER SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - COPPER SELENIDE - SPUTTER DEPOSITION
Ga2O3 GALLIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - GALLIUM OXIDE - SPUTTER DEPOSITION
Au GOLD PHYSICAL VAPOR DEPOSITION - PVD - GOLD - SPUTTER DEPOSITION
C GRAPHITE PHYSICAL VAPOR DEPOSITION - PVD - GRAPHITE - SPUTTER DEPOSITION
Hf HAFNIUM PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM - SPUTTER DEPOSITION
HfB2 HAFNIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM BORIDE - SPUTTER DEPOSITION
HfC HAFNIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM CARBIDE - SPUTTER DEPOSITION
HfN HAFNIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM NITRIDE - SPUTTER DEPOSITION
HfO2-unstabilized HAFNIUM OXIDE UNSTABILIZED PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM OXIDE UNSTABILIZED - SPUTTER DEPOSITION
HfO2-Y2O3 HAFNIUM OXIDE-YTTRIA STABILIZED PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM OXIDE-YTTRIA STABILIZED - SPUTTER DEPOSITION
HfSi2 HAFNIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - HAFNIUM SILICIDE - SPUTTER DEPOSITION
In INDIUM PHYSICAL VAPOR DEPOSITION - PVD - INDIUM - SPUTTER DEPOSITION
In2O3 INDIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - INDIUM OXIDE - SPUTTER DEPOSITION
In2Se3 INDIUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - INDIUM SELENIDE - SPUTTER DEPOSITION
In2O3-SnO2 INDIUM-TIN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - INDIUM-TIN OXIDE - SPUTTER DEPOSITION
Ir IRIDIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - IRIDIUM METAL - SPUTTER DEPOSITION
Fe IRON PHYSICAL VAPOR DEPOSITION - PVD - IRON - SPUTTER DEPOSITION
Fe2O3 IRON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - IRON OXIDE - SPUTTER DEPOSITION
Fe3O4 IRON OXIDE PHYSICAL VAPOR DEPOSITION - PVD - IRON OXIDE - SPUTTER DEPOSITION
LaAlO3 LANTHANUM ALUMINATE PHYSICAL VAPOR DEPOSITION - PVD - LANTHANUM ALUMINATE - SPUTTER DEPOSITION
LaB6 LANTHANUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - LANTHANUM BORIDE - SPUTTER DEPOSITION
LaF3 LANTHANUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LANTHANUM FLUORIDE - SPUTTER DEPOSITION
PbF2 LEAD FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LEAD FLUORIDE - SPUTTER DEPOSITION
PbO LEAD OXIDE PHYSICAL VAPOR DEPOSITION - PVD - LEAD OXIDE - SPUTTER DEPOSITION
PbSe LEAD SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - LEAD SELENIDE - SPUTTER DEPOSITION
PbTe LEAD TELLURIDE PHYSICAL VAPOR DEPOSITION - PVD - LEAD TELLURIDE - SPUTTER DEPOSITION
LiF LITHIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - LITHIUM FLUORIDE - SPUTTER DEPOSITION
LiNbO3 LITHIUM NIOBATE PHYSICAL VAPOR DEPOSITION - PVD - LITHIUM NIOBATE - SPUTTER DEPOSITION
Mg MAGNESIUM PHYSICAL VAPOR DEPOSITION - PVD - MAGNESIUM - SPUTTER DEPOSITION
MgF2 MAGNESIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - MAGNESIUM FLUORIDE - SPUTTER DEPOSITION
MgO MAGNESIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - MAGNESIUM OXIDE - SPUTTER DEPOSITION
Mn MANGANESE PHYSICAL VAPOR DEPOSITION - PVD - MANGANESE - SPUTTER DEPOSITION
Mo MOLYBDENUM PHYSICAL VAPOR DEPOSITION - PVD - MOLYBDENUM - SPUTTER DEPOSITION
MoO3 MOLYBDENUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - MOLYBDENUM OXIDE - SPUTTER DEPOSITION
MoSi2 MOLYBDENUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - MOLYBDENUM SILICIDE - SPUTTER DEPOSITION
MoS2 MOLYBDENUM SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - MOLYBDENUM SULFIDE - SPUTTER DEPOSITION
Ni NICKEL PHYSICAL VAPOR DEPOSITION - PVD - NICKEL - SPUTTER DEPOSITION
NiO NICKEL OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NICKEL OXIDE - SPUTTER DEPOSITION
Ni-Cr20% NICKEL-CHROMIUM 20% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL-CHROMIUM 20% - SPUTTER DEPOSITION
Ni-Cr NICKEL-CHROMIUM PHYSICAL VAPOR DEPOSITION - PVD - NICKEL-CHROMIUM - SPUTTER DEPOSITION
NiFe17% NICKEL IRON 17% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL IRON 17% - SPUTTER DEPOSITION
NiFe19% NICKEL IRON 19% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL IRON 19% - SPUTTER DEPOSITION
NiFe55% NICKEL IRON 55% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL IRON 55% - SPUTTER DEPOSITION
Ni-Fe NICKEL-IRON PHYSICAL VAPOR DEPOSITION - PVD - NICKEL-IRON - SPUTTER DEPOSITION
NiO NICKEL OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NICKEL OXIDE - SPUTTER DEPOSITION
NiV7% NICKEL-VANADIUM 7% PHYSICAL VAPOR DEPOSITION - PVD - NICKEL-VANADIUM 7% - SPUTTER DEPOSITION
Nb NIOBIUM PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM - SPUTTER DEPOSITION
NbC NIOBIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM CARBIDE - SPUTTER DEPOSITION
NbN NIOBIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM NITRIDE - SPUTTER DEPOSITION
Nb2O5 NIOBIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM OXIDE - SPUTTER DEPOSITION
NbSi2 NIOBIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - NIOBIUM SILICIDE - SPUTTER DEPOSITION
Pd PALLADIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - PALLADIUM METAL - SPUTTER DEPOSITION
Pt PLATINUM METAL PHYSICAL VAPOR DEPOSITION - PVD - PLATINUM METAL - SPUTTER DEPOSITION
Re RHENIUM PHYSICAL VAPOR DEPOSITION - PVD - RHENIUM - SPUTTER DEPOSITION
Rh RHODIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - RHODIUM METAL - SPUTTER DEPOSITION
Ru RUTHENIUM PHYSICAL VAPOR DEPOSITION - PVD - RUTHENIUM - SPUTTER DEPOSITION
Si SILICON PHYSICAL VAPOR DEPOSITION - PVD - SILICON - SPUTTER DEPOSITION
SiC SILICON CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - SILICON CARBIDE - SPUTTER DEPOSITION
SiO2 SILICON DIOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SILICON DIOXIDE - SPUTTER DEPOSITION
SiO SILICON MONOXIDE PHYSICAL VAPOR DEPOSITION - PVD - SILICON MONOXIDE - SPUTTER DEPOSITION
Si3N4 SILICON NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - SILICON NITRIDE - SPUTTER DEPOSITION
Ag SILVER METAL PHYSICAL VAPOR DEPOSITION - PVD - SILVER METAL - SPUTTER DEPOSITION
NaF SODIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - SODIUM FLUORIDE - SPUTTER DEPOSITION
SrF2 STRONTIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - STRONTIUM FLUORIDE - SPUTTER DEPOSITION
SrTiO3 STRONTIUM TITANATE PHYSICAL VAPOR DEPOSITION - PVD - STRONTIUM TITANATE - SPUTTER DEPOSITION
SrZrO3 STRONTIUM ZIRCONATE PHYSICAL VAPOR DEPOSITION - PVD - STRONTIUM ZIRCONATE - SPUTTER DEPOSITION
Ta TANTALUM PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM - SPUTTER DEPOSITION
TaC TANTALUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM CARBIDE - SPUTTER DEPOSITION
TaN TANTALUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM NITRIDE - SPUTTER DEPOSITION
Ta2O5 TANTALUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM OXIDE - SPUTTER DEPOSITION
TaSe2 TANTALUM SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM SELENIDE - SPUTTER DEPOSITION
TaSi2 TANTALUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM SILICIDE - SPUTTER DEPOSITION
Ta5Si3 TANTALUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TANTALUM SILICIDE - SPUTTER DEPOSITION
Te TELLURIUM PHYSICAL VAPOR DEPOSITION - PVD - TELLURIUM - SPUTTER DEPOSITION
Sn TIN PHYSICAL VAPOR DEPOSITION - PVD - TIN - SPUTTER DEPOSITION
SnO2 TIN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TIN OXIDE - SPUTTER DEPOSITION
Ti TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM - SPUTTER DEPOSITION
TiB2 TITANIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM BORIDE - SPUTTER DEPOSITION
TiC TITANIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM CARBIDE - SPUTTER DEPOSITION
TiN TITANIUM NITRIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM NITRIDE - SPUTTER DEPOSITION
TiO2 TITANIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM OXIDE - SPUTTER DEPOSITION
TiSi2 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM SILICIDE - SPUTTER DEPOSITION
Ti5Si3 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM SILICIDE - SPUTTER DEPOSITION
TiSi2 TITANIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TITANIUM SILICIDE - SPUTTER DEPOSITION
W TUNGSTEN PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN - SPUTTER DEPOSITION
WC TUNGSTEN CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN CARBIDE - SPUTTER DEPOSITION
WO3 TUNGSTEN OXIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN OXIDE - SPUTTER DEPOSITION
WSe2 TUNGSTEN SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN SELENIDE - SPUTTER DEPOSITION
WSi2 TUNGSTEN SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN SILICIDE - SPUTTER DEPOSITION
WS2 TUNGSTEN SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN SULFIDE - SPUTTER DEPOSITION
W-Ti TUNGSTEN-TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN-TITANIUM - SPUTTER DEPOSITION
W-Ti10% TUNGSTEN-TITANIUM 10% PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN-TITANIUM 10% - SPUTTER DEPOSITION
W-Ti TUNGSTEN-TITANIUM PHYSICAL VAPOR DEPOSITION - PVD - TUNGSTEN-TITANIUM - SPUTTER DEPOSITION
V VANADIUM PHYSICAL VAPOR DEPOSITION - PVD - VANADIUM - SPUTTER DEPOSITION
V2O5 VANADIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - VANADIUM OXIDE - SPUTTER DEPOSITION
VSi2 VANADIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - VANADIUM SILICIDE - SPUTTER DEPOSITION
YF3 YTTRIUM FLUORIDE PHYSICAL VAPOR DEPOSITION - PVD - YTTRIUM FLUORIDE - SPUTTER DEPOSITION
Y YTTRIUM METAL PHYSICAL VAPOR DEPOSITION - PVD - YTTRIUM METAL - SPUTTER DEPOSITION
Y2O3 YTTRIUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - YTTRIUM OXIDE - SPUTTER DEPOSITION
Zn ZINC PHYSICAL VAPOR DEPOSITION - PVD - ZINC - SPUTTER DEPOSITION
ZnO ZINC OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZINC OXIDE - SPUTTER DEPOSITION
ZnO-Al2O3 ZINC OXIDE-ALUMINUM OXIDE PHYSICAL VAPOR DEPOSITION - PVD - ZINC OXIDE-ALUMINUM OXIDE - SPUTTER DEPOSITION
ZnSe ZINC SELENIDE PHYSICAL VAPOR DEPOSITION - PVD - ZINC SELENIDE - SPUTTER DEPOSITION
ZnS ZINC SULFIDE PHYSICAL VAPOR DEPOSITION - PVD - ZINC SULFIDE - SPUTTER DEPOSITION
Zr ZIRCONIUM PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM - SPUTTER DEPOSITION
ZrB2 ZIRCONIUM BORIDE PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM BORIDE - SPUTTER DEPOSITION
ZrC ZIRCONIUM CARBIDE PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM CARBIDE - SPUTTER DEPOSITION
ZrO2-unstabilized ZIRCONIUM OXIDE UNSTABILIZED PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM OXIDE UNSTABILIZED - SPUTTER DEPOSITION
ZrO2-CaO ZIRCONIUM OXIDE-CALCIA STABILIZED PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM OXIDE-CALCIA STABILIZED - SPUTTER DEPOSITION
ZrO2-Y2O3 ZIRCONIUM OXIDE-YTTRIA STABILIZED PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM OXIDE-YTTRIA STABILIZED - SPUTTER DEPOSITION
ZrSi2 ZIRCONIUM SILICIDE PHYSICAL VAPOR DEPOSITION - PVD - ZIRCONIUM SILICIDE - SPUTTER DEPOSITION

Physical vapor deposition (PVD) is a widely used technique in semiconductor integrated circuit (IC) manufacturing.
Sputter deposition is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a "target," that is source, which then deposits onto a "substrate," such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment.
Sputtered atoms ejected from the target have a wide energy distribution, typically up to tens of eV (100,000 K). The sputtered ions (typically only about 1% of the ejected particles is ionized) can ballistically fly from the target in straight lines and impact energetically on the substrates or vacuum chamber causing resputtering. At higher gas pressures, they collide with the gas atoms that act as a moderator and move diffusively, reaching the substrates or vacuum chamber wall and condensing after undergoing a random walk. The entire range from high-energy ballistic impact to low-energy thermalized motion is accessible by changing the background gas pressure. The sputtering gas is often an inert gas such as argon. For efficient momentum transfer, the atomic weight of the sputtering gas should be close to the atomic weight of the target, so for sputtering light elements neon is preferable, while for heavy elements krypton or xenon are used. Reactive gases can also be used to sputter compounds. The compound can be formed on the target surface, in-flight or on the substrate depending on the process parameters. The availability of many parameters that control sputter deposition make it a complex process, but also allow experts a large degree of control over the growth and microstructure of the film.
Sputtering is used extensively in the semiconductor industry to deposit thin films of various materials in integrated circuit processing. Thin antireflection coatings on glass for optical applications are also deposited by sputtering. Because of the low substrate temperatures used, sputtering is an ideal method to deposit contact metals for thin-film transistors. Perhaps the most familiar products of sputtering are low-emissivity coatings on glass, used in double-pane window assemblies. The coating is a multilayer containing silver and metal oxides such as zinc oxide, tin oxide, or titanium dioxide. Sputtering is also used to metalize plastics such as potato chip bags. A large industry has developed around tool bit coating using sputtered nitrides, such as titanium nitride, creating the familiar gold colored hard coat.

Home>PVD REACTIVE SPUTTERING> Last updated: August 29, 2009

HTE LABS Tel:(408)758-8691 Fax:(408)986-8027

©1990-2017 HTE LABS All rights reserved. No material from this site may be used or reproduced without permission.